From okilic at stanford.edu Thu Feb 3 18:01:06 2005 From: okilic at stanford.edu (Onur Kilic) Date: Thu, 3 Feb 2005 18:01:06 -0800 Subject: STS will be done early Message-ID: <1107482466.4202d7629d3c4@webmail.stanford.edu> I'll be finished at around 6:45 pm. Free to use till 9pm. -- Onur Kilic PhD Candidate Applied Physics Stanford University http://onurkilic.com From kevhuang at stanford.edu Sat Feb 5 13:24:39 2005 From: kevhuang at stanford.edu (Kevin T Huang) Date: Sat, 5 Feb 2005 13:24:39 -0800 Subject: need help doing the etching Message-ID: <1107638679.420539970541b@webmail.stanford.edu> Hi, I want to etch a 10 um by 10 um by 10 um holes in Si wafer with straight and smooth side walls. I used the SMOOSHAL program which gives me straight but rough side walls. I heard two ways to make the walls smoother: 1) SF6 only etch at the end: I tried a 5-minute SF6 only after a 3.5-minute SMOOSHAL but this doesn't do it. Is there any other recipes I can try? 2) oxide the wafer after it's etched and etch away the oxide: Can someone please tell me more detail about this process? Thank you for your time. Kevin From altug at stanford.edu Sat Feb 5 14:37:33 2005 From: altug at stanford.edu (Hatice Altug) Date: Sat, 5 Feb 2005 14:37:33 -0800 Subject: sts::: 15:00-19:00 is free References: <1107482466.4202d7629d3c4@webmail.stanford.edu> Message-ID: <000c01c50bd3$4b0d6060$d65540ab@hatice> sample is not ready From aflannery at invensense.com Mon Feb 7 19:40:02 2005 From: aflannery at invensense.com (Anthony Flannery) Date: Mon, 7 Feb 2005 19:40:02 -0800 Subject: Reservation Removed Message-ID: At 4:00 PM tomorrow. Not ready Anthony F. Flannery Jr. Director of Development MEMS Gyroscope Invensense, Inc. 2900 Gordon Ave., Suite 203 Santa Clara, CA 95051 Tel: 408-720-8482 ext. 203 Cell: 408-515-4026 -------------- next part -------------- An HTML attachment was scrubbed... URL: From amanu at stanford.edu Tue Feb 15 17:15:44 2005 From: amanu at stanford.edu (Manu Agarwal) Date: Tue, 15 Feb 2005 17:15:44 -0800 Subject: reservation removed, today 21:00-midnight, sorry for the late notice Message-ID: <42129EC0.1090108@stanford.edu> From amanu at stanford.edu Thu Feb 17 16:25:49 2005 From: amanu at stanford.edu (Manu Agarwal) Date: Thu, 17 Feb 2005 16:25:49 -0800 Subject: reservation released, 20:30-00:00, finished early, sorry for late notice Message-ID: <1108686349.4215360d663cb@webmail.stanford.edu> From kevhuang at stanford.edu Sun Feb 20 09:10:49 2005 From: kevhuang at stanford.edu (Kevin T Huang) Date: Sun, 20 Feb 2005 09:10:49 -0800 Subject: the "overrun" function Message-ID: <1108919449.4218c4995ec37@webmail.stanford.edu> Hi, I am trying to mix SF6 and C4F8 simultaneously in an etching process. I know that I can do this with the overrun function. Could someone tell me how this works? If I my etch/passivation tims are 2.4s/2s, do I set my overrun times to 2s/2.4s ? Thank you for your help. Kevin From ifushman at stanford.edu Tue Feb 22 11:32:28 2005 From: ifushman at stanford.edu (Ilya Fushman) Date: Tue, 22 Feb 2005 11:32:28 -0800 Subject: res removed 4-8pm Message-ID: <002b01c51915$41961690$555540ab@BEHEMOTH> sample not ready -------------- next part -------------- An HTML attachment was scrubbed... URL: From erictao at stanford.edu Tue Feb 22 15:43:15 2005 From: erictao at stanford.edu (Eric Tao) Date: Tue, 22 Feb 2005 15:43:15 -0800 Subject: STS open tonight Message-ID: <6.0.1.1.2.20050222154147.02cc2ab8@erictonn.pobox.stanford.edu> Done early. -eric ps. someone keeps changing original recipes of STS etcher, please STOP doing so.