sts1 micrograss problem

Huang Kevin kevhuang at stanford.edu
Wed Jan 11 15:16:28 PST 2006


Yes, I started experiencing this problem last semester and I didn't do a
chamber clean before my etch.

Kevin


On 1/11/06, Wibool Piyawattanametha <wibool at stanford.edu> wrote:
>
>  Hi All,
>
>
>
> Almost every run that we use STS1 with smoothshal recipe, we have
> silicon-micrograss problem.     We use an oxide mask for STS etching with
> the etching time of around 83 mins.    The wafer comes out completely black
> in the etching trenches and openings.   I have some questions to ask as
> follows:
>
>
>
> 1.  Has anyone experienced the same problem whether or not they do the
> chamber clean?
>
> 2.  Do someone have any modified recipes for the smoothshal to remove the
> excessive polymer to prevent this micrograss?
>
>
>
> Thank you very much.
>
>
>
> WP
>
>
>
> Wibool Piyawattanametha, Ph.D.
> Stanford University
> Departments of Applied Physics, Biological Sciences, and Pediatrics
> James H. Clark Center (Bio-X) - Room W080
> 318 Campus Drive
> Stanford, CA 94305
> T: (650) 725-4097
> F: (650) 724-5805
>
>
>



--
==================================
Kevin Huang
Ph.D. Student, Peumans Group
Stanford Organic Electronics Lab
Dept. of Electrical Engineering
Email: kevhuang at stanford.edu
Phone: (650) 725-6924
==================================
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