From bwchui at yahoo.com  Thu Mar  1 00:40:55 2007
From: bwchui at yahoo.com (Benjamin Chui)
Date: Thu, 1 Mar 2007 00:40:55 -0800 (PST)
Subject: STSetch available thursday till 1600
Message-ID: <688889.61984.qm@web36514.mail.mud.yahoo.com>

STSetch available thursday till 1600


From eenriquez at snf.stanford.edu  Mon Mar 12 14:42:53 2007
From: eenriquez at snf.stanford.edu (Elmer Enriquez)
Date: Mon, 12 Mar 2007 14:42:53 -0700
Subject: STSetcher update
Message-ID: <45F5C95D.7000500@snf.stanford.edu>

Found what we believe to be the root cause of frequent system lock-up.  
The systems DC power supply's cooling fan was failing which caused the 
supply to overheat and eventually shut-off.  Replaced the fan and 
monitored the system for over 3.5 hours.  System did not lock-up.  Still 
have one minor problem.  The system errored for no platten power when I 
tried to run an O2 clean.  Water flow checked OK.  Need to check water 
resistivity. Also need to check backside He.


From jprovine at stanford.edu  Sat Mar 24 10:51:10 2007
From: jprovine at stanford.edu (J Provine)
Date: Sat, 24 Mar 2007 10:51:10 -0700
Subject: cooling flow and pressure values changed...why?
Message-ID: <1174758670.4605650e693e6@webmail.stanford.edu>

yesterday i reported that the cooling flow and pressure values had been
changed.  i never received information about why or when they were changed
(in particular why).  having successfully run dummy wafers i'm processing
with the new parameters without incident and a change in etch that is
within statistical variation of the machine.  my problem on coral was
cleared without explanation so i am asking again, why were the cooling
values changed?  it doesn't to me seem like something that should go
unannounced.  please clear this up for me.

~j