From edmyers at stanford.edu  Tue Oct  3 10:50:44 2006
From: edmyers at stanford.edu (Ed Myers)
Date: Tue, 03 Oct 2006 10:50:44 -0700
Subject: STS Etchers
Message-ID: <6.2.5.6.2.20061003104505.03c392b8@stanford.edu>

All,

Trevor from STS is asking for users to run the system.  He wants to 
see the equipment ran as many hours as possible while he is still in 
the area (he departs on Thursday).  Right now he is running dummy 
wafers trying to accumulate time on the systems.  If you have wafers 
to run, please feel free to get on the system.  Trevor will happily 
move aside so you can run your wafers.

Outside of the SOI template on STSetch2 all the process etches look 
good.  We are seeing occasional tuning problems on the SOI 
template.  The tuning problem is what he is trying to understand.  It 
does not damage your wafer, but my give you a slower etch rate.

Regards,

Ed




From eenriquez at snf.stanford.edu  Fri Oct 13 15:53:52 2006
From: eenriquez at snf.stanford.edu (Elmer Enriquez)
Date: Fri, 13 Oct 2006 15:53:52 -0700
Subject: STSetch2 update
Message-ID: <45301900.8050507@snf.stanford.edu>

STSetch2 is currently down for a handler problem.  Basicaly, the system 
alarms for the platen and wafer lift pins not being in required position 
in time.  We have tried extendeding  the time for the platen and pins to 
get in position before the system alarms.  We have also tried speeding 
up platen and pins.  But the system seems to alarm almost immediately as 
soon as the command to the platen and pins are sent.  I have already 
sent a message to STS regarding this problem


From edmyers at stanford.edu  Wed Oct 18 14:44:34 2006
From: edmyers at stanford.edu (Ed Myers)
Date: Wed, 18 Oct 2006 14:44:34 -0700
Subject: STS Etch2 Update
Message-ID: <6.2.5.6.2.20061018143659.03dc23b0@stanford.edu>

All,

I worked on the SOI recipe yesterday.  The success of the SOI recipe 
seems to be VERY sensitive to your coil tuning parameters (not so 
much with the Smooth-Shallow recipe).  By changing the tuning value 
by % moved me from a state where the etch plasma extinguished to one 
which was stable.  This tuning sensitivity was observed by STS while 
they were on site.  The copied our log files and carried them back to 
the UK for analysis.  I have not heard anything back from them.

You can use the SOI Template tuning points as a starting position if 
your recipe is having problems.  (By the way who deleted or renamed 
the recipe)  If your recipe has tuning problems you will see a yellow 
fault indicating the coil could not reach set point, if you don't 
stay around to watch the plasma.  The downside is, it's the etch 
cycle which is blinking off.  Your etch rate will be drastically 
reduced, while you are still getting your polymer formation.  Be obserevant.

Ed