Comment svgcoat SNF 2011-01-12 15:16:25: 220-3 3.0um released

gsosa at snf.stanford.edu gsosa at snf.stanford.edu
Wed Jan 12 15:16:25 PST 2011


220-3 3.0 micron resist programs( with and without EBR) released for use.. Thickness test looks good. Much improvement but may get an intermittant wafer with slight poor spin. Please check wafers and report any problems. Still working on 220-3 4.0 micron programs and 220-7 process.




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