From mahnaz at snf.stanford.edu Mon Jan 7 16:10:52 2002 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Mon, 07 Jan 2002 16:10:52 -0800 Subject: Prog. #7,8 Message-ID: <3C3A390B.88BCC37B@snf.stanford.edu> hello all, I played with the two recipe 1 um and 1.6 all afternoon, it dispense too fast and I was not able to get it slow down. If you are using these two recipes to get back side coverage is good enough other than that I have asked UTS to come in early in the morning. mahnaz From mahnaz at snf.stanford.edu Tue Jan 8 12:21:19 2002 From: mahnaz at snf.stanford.edu (Mahnaz Mansourpour) Date: Tue, 08 Jan 2002 12:21:19 -0800 Subject: up date Message-ID: <3C3B54BF.36CDD16C@snf.stanford.edu> Hello all, The new track is not ready for use yet, I will send out an email when the track 2 is up. The front track or old track is up and all the programs are set. Please do not change the standard recipes and no manual prime there. See me if you are doing nonstandard stuff and we need to go over few changes, Mike, Mario, uli and I could cover that. mahnaz From beckwith at snf.stanford.edu Fri Jan 11 09:42:38 2002 From: beckwith at snf.stanford.edu (Sharleen Beckwith) Date: Fri, 11 Jan 2002 09:42:38 -0800 Subject: Suggestion RE: Photoresist lifting problems Message-ID: On Jan 10, 2002 6:50:18 PM Pascal (pzwahlen at snf.stanford.edu) said: >Many users have experienced PR delamination during the development >for wafers coated on Thursday Jan 10th. Problem could come from a >bad lot of PR or bad temperature and humidity in the cleanroom. >Wafers that I coated on Tuesday night, had no problem during >development but very bad delamination during wet etching (BOE). In >this case I was thinking that the problem might rather come from bad >HMDS priming. I should have more results to discuss about tomorrow >evening. You can contact me for more inputs then. This is not the first time we have had this sort of problem. In the future I think it would benefit us all if at the first sign of lifting resist (at etch, or at svgdev) the person who has the problem immediately sends a message to: svgcoat at snf.stanford.edu. This way we would all be alerted to watch out. I think we should start using these equipment user addresses as a forum on equipment issues. Most people do not get the shutdown and problem messages sent through coral, and it appears we cannot count on staff to send out messages of this sort. This message would also short cut the "it must be a problem with your wafers" response we all get. We could save ourselves hours of time trying to figure out what we did wrong with our processing when, in fact, it is an equipment problem. You can count the time spent composing and sending the message as "community service" : ) Let me know what you all think about this (I am glad my resist lifted at svgdev and not in the BOE tank!). Sharleen From mbadi at relgyro.stanford.edu Fri Jan 11 18:44:12 2002 From: mbadi at relgyro.stanford.edu (Mohammed H. Badi) Date: Fri, 11 Jan 2002 18:44:12 -0800 (PST) Subject: Resolution? Re: Suggestion RE: Photoresist lifting problems In-Reply-To: Message-ID: Hello all, I was wondering if the resist adhesion problem was resovled today (Friday). I would like to do some processing this weekend but I obviously would like to avoid any delamination problems. If you know anything, please do let me know (but don't email the whole list -- we don't want to fill up everyone's mailbox). I'll post a message with the responses once I hear back from people. Thanks. moe. mbadi at snf On Fri, 11 Jan 2002, Sharleen Beckwith wrote: > On Jan 10, 2002 6:50:18 PM Pascal (pzwahlen at snf.stanford.edu) said: > > >Many users have experienced PR delamination during the development > >for wafers coated on Thursday Jan 10th. Problem could come from a > >bad lot of PR or bad temperature and humidity in the cleanroom. > >Wafers that I coated on Tuesday night, had no problem during > >development but very bad delamination during wet etching (BOE). In > >this case I was thinking that the problem might rather come from bad > >HMDS priming. I should have more results to discuss about tomorrow > >evening. You can contact me for more inputs then. > > This is not the first time we have had this sort of problem. In the > future I think it would benefit us all if at the first sign of > lifting resist (at etch, or at svgdev) the person who has the problem > immediately sends a message to: svgcoat at snf.stanford.edu. This way we > would all be alerted to watch out. I think we should start using > these equipment user addresses as a forum on equipment issues. Most > people do not get the shutdown and problem messages sent through > coral, and it appears we cannot count on staff to send out messages > of this sort. > > This message would also short cut the "it must be a problem with your > wafers" response we all get. We could save ourselves hours of time > trying to figure out what we did wrong with our processing when, in > fact, it is an equipment problem. > > You can count the time spent composing and sending the message as > "community service" : ) > > Let me know what you all think about this (I am glad my resist lifted > at svgdev and not in the BOE tank!). > > Sharleen > > moe. -------- Mohammed H. Badi I'm just sipping on chamomile. 650-906-0663 From mbadi at relgyro.stanford.edu Fri Jan 11 20:42:44 2002 From: mbadi at relgyro.stanford.edu (Mohammed H. Badi) Date: Fri, 11 Jan 2002 20:42:44 -0800 (PST) Subject: Coater Problem Resolved Message-ID: Thanks to everyone who wrote back. The delamination problem is indeed fixed -- the problem was that the HMDS tank was empty. People did warn about getting an even coat for 7um resist coverage, though. moe. -------- Mohammed H. Badi I'm just sipping on chamomile. 650-906-0663 From vilanova at snf.stanford.edu Wed Jan 16 09:06:34 2002 From: vilanova at snf.stanford.edu (Mario Vilanova) Date: Wed, 16 Jan 2002 09:06:34 -0800 (PST) Subject: Problem svgcoat 2002-01-15 19:44:39: cannot work in auto mode (fwd) Message-ID: ---------- Forwarded message ---------- Date: Jan 16, 2002 7:38:54 AM From: vilanova at snf.stanford.edu To: svgcoat-pcs at snf.stanford.edu Subject: Re: Problem svgcoat 2002-01-15 19:44:39: cannot work in auto mode when the Little photoresist container is full the alarm will sound and that will make the track to shutdown,what you have to do in that case is : on the top right hand side there's a panel press down button fo track # 1 and the pump will empty the containerautomatically.after that just turn on the Alarm swtich. From sanli at piezo.Stanford.EDU Mon Jan 21 12:39:09 2002 From: sanli at piezo.Stanford.EDU (Sanli Ergun) Date: Mon, 21 Jan 2002 12:39:09 -0800 (PST) Subject: coater 1 problem Message-ID: Today, I used track one of svgcoat, but the lithography didn't work. The resist peeled of. There may be HMDS problem again. ________________________________________________________ Arif Sanli Ergun Engineering Research Associate E. L. Ginzton Laboratory, Room : 130, Stanford University, Stanford, CA, 94305-4085 Phone: (650) 723-8447 Fax : (650) 725-7509 www : http://piezo.stanford.edu/group/IRP/sanliIRP.html From martinez at snf.stanford.edu Wed Jan 23 09:30:22 2002 From: martinez at snf.stanford.edu (Mike Martinez) Date: Wed, 23 Jan 2002 09:30:22 -0800 Subject: track 2 Message-ID: <3C4EF32D.473D84A4@snf.stanford.edu> Lab users please note, SVGCOAT2 is not quite ready for use. An additional delay has been introduced by a user who damaged the wafer chuck and broke a pin on the wafer tranfer motor. A new motor will need to be ordered, installed, and tested. Please wait until the shut down status has been removed in coral before using this track.