From pnataraj at kovio.com Mon Feb 16 11:50:05 2004 From: pnataraj at kovio.com (Pradeep K. Nataraj) Date: Mon, 16 Feb 2004 11:50:05 -0800 Subject: Photoresist as dielectric layer? Message-ID: <17AB8DED04002F4E803EE9A3E29ECFA80C9BAE@koviomail.print-this.com> Dear users, I am trying to figure out if any one of you has experience using photoresist (AZ3612/SPR220) as gate dielectric? I am trying to probe(C-V) the oxide layer (I don't want just to put Al or any metal and probe through it). I would like to use photoresist as protective/dielectric layer between the metal and oxide layer. I would appreciate for sharing any knowledge regarding this matter. Thank you for your time. Pradeep. -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at snf.stanford.edu Tue Feb 17 11:20:03 2004 From: mtang at snf.stanford.edu (Mary Tang) Date: Tue, 17 Feb 2004 11:20:03 -0800 Subject: HMDS Canister Message-ID: <40326962.E909E807@snf.stanford.edu> Hi all -- As you may know, last week someone removed the N2 line from the HMDS canister (which meant there was no HMDS dispensed) and changed the programs for EBR and arm positions. Now, to whomever did these things: This is really bad form, and really messed up the work of people. Yes, this is a research lab and people have to try new things -- Mistakes can be made and are all a part of being in a creative learning environment... but we ALL have to take responsibility for our actions. We are a shared facility, so we all have to consider the safety of others and respect that others need to do work here as well. So... If you did this and are willing to be a good lab community member and take responsibility for these actions, we'll have a little chat, and will ask you to make it up to the other svgcoat users by doing a little community service. If, on the other hand, we have to do detective work, the consequences may be much more dire (and probably scaled to the degree of annoyance incurred by all involved.) Finally, I know it's awfully tempting to use svgcoat for "just one wafer" when some one else has it enabled. Granted, on some tools, it's the only way to operate (i.e., wbnonmetal.) However, for svgcoat, each of us should enable it in our own name. Understand that, whatever the circumstances, the person who has a tool enabled is completely responsible for it during their enable time -- i.e., you are responsible even for OTHER people's use of the tool, if it's under YOUR login. (At least this is what we go by, unless someone can come up with a better system...) Thanks for your attention -- Mary -- Mary X. Tang, Ph.D. Stanford Nanofabrication Facility CIS Room 136, Mail Code 4070 Stanford, CA 94305 (650)723-9980 mtang at stanford.edu http://snf.stanford.edu From beckwith at cis.stanford.edu Tue Feb 17 11:38:22 2004 From: beckwith at cis.stanford.edu (Sharleen Beckwith) Date: Tue, 17 Feb 2004 11:38:22 -0800 Subject: HMDS Canister In-Reply-To: <40326962.E909E807@snf.stanford.edu> References: <40326962.E909E807@snf.stanford.edu> Message-ID: Here is what I find annoying in the litho room: I have the coater enabled, I am running test wafers, etc. I have to leave the coater for a few minutes, when I return someone else is using it, usually with it still enabled in my name. If the coater or developer (this is the worst one for things like this happening, because I am usually exposing one wafer while the other one is being developed so I am not standing right there by the developer) is enabled by someone and you need to use it at LEAST make some effort to find the person who has it enabled to make sure they are done. It is especially annoying when someone changes the program in the middle of what I am doing. Things like this happen at the wet benches as well. Someone will just walk up and plunk their wafers in a hot pot when the bench is enabled by someone else. Often times there is a queue, which that person totally ignores, or someone has just changed the chemicals and is returning the acid cart, when they get back they find someone else's wafers in their clean acid. A large part of this problem has to do with people NOT disabling equipment when they finish. I find the coater, developer, and wet benches left enabled by people who have left the labs hours before. This just compounds the problem. Sharleen >Finally, I know it's awfully tempting to use svgcoat for "just one >wafer" when some one else has it enabled. Granted, on some tools, it's >the only way to operate (i.e., wbnonmetal.) However, for svgcoat, each >of us should enable it in our own name. Understand that, whatever the >circumstances, the person who has a tool enabled is completely >responsible for it during their enable time -- i.e., you are >responsible even for OTHER people's use of the tool, if it's under YOUR >login. (At least this is what we go by, unless someone can come up with >a better system...) -- Whether you believe in God or not does not matter so much, whether you believe in Buddha or not does not matter so much. You must lead a good life. His Holiness Tenzin Gyatso, The Fourteenth Dalai Lama