Comment svgcoat2 SNF 2008-05-24 18:58:39: Dripping PR

tura at snf.stanford.edu tura at snf.stanford.edu
Sat May 24 18:58:40 PDT 2008


For the 1um 3612 program with EBR, the tip starts dripping photoresist as it is approaching the wafer. It is obvious from the photoresist under the path of the tip. It seems not to cause very significant non-uniformities on the wafer.




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