From mtan at snf.stanford.edu Thu Aug 5 13:24:38 2010 From: mtan at snf.stanford.edu (mtan at snf.stanford.edu) Date: Thu, 5 Aug 2010 13:24:38 -0700 Subject: Problem svgcoat2 SNF 2010-08-05 13:24:37: track stuck. system doesn't start Message-ID: From vilanova at snf.stanford.edu Thu Aug 5 13:53:44 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Thu, 5 Aug 2010 13:53:44 -0700 Subject: Problem svgcoat2 SNF 2010-08-05 13:24:37: track stuck. system doesn't start Message-ID: found HMDS hotplate full of resist residues, Cleaned and adjusted hotplate rails, cycled wafers, ok to use. From rostam at snf.stanford.edu Fri Aug 6 12:14:40 2010 From: rostam at snf.stanford.edu (rostam at snf.stanford.edu) Date: Fri, 6 Aug 2010 12:14:40 -0700 Subject: Problem svgcoat2 SNF 2010-08-06 12:14:40: red spot on the chuck Message-ID: There is a red spot at the center of the chuck. I tried to remove it with acetone and IPA. It didn't come off. It leaves stains on the back of the wafer. From jparker at snf.stanford.edu Fri Aug 6 17:01:57 2010 From: jparker at snf.stanford.edu (jparker at snf.stanford.edu) Date: Fri, 6 Aug 2010 17:01:57 -0700 Subject: Problem svgcoat2 SNF 2010-08-06 17:01:57: Disp1 bubble Message-ID: Large (~1/3 cm long) bubble gets sucked back into dispense 1 line after dispense. Happened on 3 of 3 test wafers running program 7 (1um 3612). From vilanova at snf.stanford.edu Mon Aug 9 09:03:44 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 9 Aug 2010 09:03:44 -0700 Subject: Problem svgcoat2 SNF 2010-08-06 12:14:40: red spot on the chuck Message-ID: Purged Line for 3612 , Uniformity Looks Good no air bubble in the line cleaned resist residues from chuck, theres still a small residue on the chuck that I couldnt remove but the wafers are coming out clean , Also I cleaned chuck On SVGcoat # 1 , cleaned the catch cup cycled wafers ok to use, From vilanova at snf.stanford.edu Mon Aug 9 09:03:50 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 9 Aug 2010 09:03:50 -0700 Subject: Problem svgcoat2 SNF 2010-08-06 17:01:57: Disp1 bubble Message-ID: Purged Line for 3612 , Uniformity Looks Good no air bubble in the line cleaned resist residues from chuck, theres still a small residue on the chuck that I couldnt remove but the wafers are coming out clean , Also I cleaned chuck On SVGcoat # 1 , cleaned the catch cup cycled wafers ok to use, From grahamab at snf.stanford.edu Tue Aug 10 19:29:53 2010 From: grahamab at snf.stanford.edu (grahamab at snf.stanford.edu) Date: Tue, 10 Aug 2010 19:29:53 -0700 Subject: Problem svgcoat2 SNF 2010-08-10 19:29:52: arm not coming up on its own Message-ID: dispense arm isn't coming up on its own. it comes up with a little help and moves side to side just fine (and goes down fine). was doing it a lot, but would occasionally work without trouble (maybe 1 of every 5 wafers it would work). tool is still operable, but needs babysitting. From gsosa at snf.stanford.edu Wed Aug 11 11:38:16 2010 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Wed, 11 Aug 2010 11:38:16 -0700 Subject: Problem svgcoat2 SNF 2010-08-10 19:29:52: arm not coming up on its own Message-ID: Cycled at least 25 wafers through the system. Could not reproduce the problem. Cleaned the coater bowl and belts. Checked Backside rinse with glass wafer- All OK. Pumped out internal waste container. From mtan at snf.stanford.edu Sun Aug 15 18:11:20 2010 From: mtan at snf.stanford.edu (mtan at snf.stanford.edu) Date: Sun, 15 Aug 2010 18:11:20 -0700 Subject: Problem svgcoat2 SNF 2010-08-15 18:11:19: track won start Message-ID: wafer track is not working. previous user also reported problem with track belt. From vilanova at snf.stanford.edu Mon Aug 16 08:27:09 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 16 Aug 2010 08:27:09 -0700 Subject: Problem svgcoat2 SNF 2010-08-15 18:11:19: track won start Message-ID: Small Resist waste carboy Under the track was full, Emptied carboy and cycled wafers, Ok to use From luckys at snf.stanford.edu Thu Aug 19 12:21:06 2010 From: luckys at snf.stanford.edu (luckys at snf.stanford.edu) Date: Thu, 19 Aug 2010 12:21:06 -0700 Subject: Problem svgcoat2 SNF 2010-08-19 12:21:06: Bubble on suck back Message-ID: Dispense 1 ....3 of 3 wafers had a bubble in the nozzle. Program 8 for 1.6um thickness. Please fix it!!! From vilanova at snf.stanford.edu Thu Aug 19 14:56:54 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Thu, 19 Aug 2010 14:56:54 -0700 Subject: Problem svgcoat2 SNF 2010-08-19 12:21:06: Bubble on suck back Message-ID: Someone Probably replaced the bottle , I cycled wafers ( 6 Each ) and the bubble is gone also the Suck back is normal, ok to use. From xzhuan1 at snf.stanford.edu Fri Aug 20 10:11:10 2010 From: xzhuan1 at snf.stanford.edu (xzhuan1 at snf.stanford.edu) Date: Fri, 20 Aug 2010 10:11:10 -0700 Subject: Problem svgcoat2 SNF 2010-08-20 10:11:10: belt not moving Message-ID: wafer won't go to the resist dispense chuck because the belt does not move. From gsosa at snf.stanford.edu Fri Aug 20 12:05:40 2010 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 20 Aug 2010 12:05:40 -0700 Subject: Problem svgcoat2 SNF 2010-08-20 10:11:10: belt not moving Message-ID: User processed wafers successfuly after track reset.. Checked wafer transfer with test wafers. Also processed 12 silicon wafers with 955 0.7 process. No alarms or interruptions during wafer processing.. Track tested OK. Inspected wafers. Front and backside EBR good. Spin quality good, centering good. No backside contamination. Track OK. From gsosa at snf.stanford.edu Fri Aug 20 12:08:15 2010 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 20 Aug 2010 12:08:15 -0700 Subject: Comment svgcoat2 SNF 2010-08-20 12:08:14: 955 0.7 thickness 8/20 Message-ID: Checked the 0.7 micron resist program for SPR 955-.7 photoresist. Target thickness = 0.7 microns. Mean thickness(5 points): 6897 Angstroms, Std Dev. 13 Angstroms. Spin quality looked good. EBR looked good and backs of wafers looked clean. From jwpchen at snf.stanford.edu Sat Aug 21 05:28:35 2010 From: jwpchen at snf.stanford.edu (jwpchen at snf.stanford.edu) Date: Sat, 21 Aug 2010 05:28:35 -0700 Subject: Problem svgcoat2 SNF 2010-08-21 05:28:34: prog8 1.6um resist globs on wafer Message-ID: ran prog8 1.6um 5mm EBR... wafers end up with globs of resist dropped on edge of wafer, makes track dirty, i cleaned up as much as possible From kyunglok at snf.stanford.edu Mon Aug 23 06:01:50 2010 From: kyunglok at snf.stanford.edu (kyunglok at snf.stanford.edu) Date: Mon, 23 Aug 2010 06:01:50 -0700 Subject: Problem svgcoat2 SNF 2010-08-23 06:01:50: 3612 resist dropping on wafer during coating Message-ID: 10/10 wafers became bad. From vilanova at snf.stanford.edu Mon Aug 23 07:53:37 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 23 Aug 2010 07:53:37 -0700 Subject: Problem svgcoat2 SNF 2010-08-21 05:28:34: prog8 1.6um resist globs on wafer Message-ID: someone change the resist bottle and left the Syphon TUbe( the TUbe that goes into the resist bottle ) Almost out so therefore the System was nt working properly , there was a lot of bubbles and suck back wasnt working at all, Pushed the TUbing all the way in , cycled wafers Uniformity Look good, Ok to use. From vilanova at snf.stanford.edu Mon Aug 23 07:53:48 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 23 Aug 2010 07:53:48 -0700 Subject: Problem svgcoat2 SNF 2010-08-23 06:01:50: 3612 resist dropping on wafer during coating Message-ID: someone change the resist bottle and left the Syphon TUbe( the TUbe that goes into the resist bottle ) Almost out so therefore the System was nt working properly , there was a lot of bubbles and suck back wasnt working at all, Pushed the TUbing all the way in , cycled wafers Uniformity Look good, Ok to use. From calarrudo at snf.stanford.edu Mon Aug 23 18:11:25 2010 From: calarrudo at snf.stanford.edu (calarrudo at snf.stanford.edu) Date: Mon, 23 Aug 2010 18:11:25 -0700 Subject: Problem svgcoat2 SNF 2010-08-23 18:11:24: Streaks Message-ID: The las three or four weeks the SVG Coater Track 2 has had an ongoing problem of leaving starburst straks on the my wafers and other lab members wafers. I talked to Gary Sosa about the problem a while back. it doesn't seem to matter if you spin rinse dry your wafers prior tp the prime or whether you run 5 test wafers in a row there are still streaks. This is frustrating to me because I have to rework my wafers constantly. From mahnaz at snf.stanford.edu Tue Aug 24 14:19:25 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 24 Aug 2010 14:19:25 -0700 Subject: Problem svgcoat2 SNF 2010-08-24 14:19:24: user ran 3 um Message-ID: either the chuck or nozzel is not center at all. From filip at snf.stanford.edu Fri Aug 27 17:15:35 2010 From: filip at snf.stanford.edu (filip at snf.stanford.edu) Date: Fri, 27 Aug 2010 17:15:35 -0700 Subject: Problem svgcoat2 SNF 2010-08-27 17:15:35: 3612 nozzle DRIPS Message-ID: From kyunglok at snf.stanford.edu Sun Aug 29 08:49:52 2010 From: kyunglok at snf.stanford.edu (kyunglok at snf.stanford.edu) Date: Sun, 29 Aug 2010 08:49:52 -0700 Subject: Problem svgcoat2 SNF 2010-08-29 08:49:51: Same problem : 3612 nozzle drip Message-ID: From vilanova at snf.stanford.edu Mon Aug 30 11:44:59 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 30 Aug 2010 11:44:59 -0700 Subject: Problem svgcoat2 SNF 2010-08-30 11:44:59: 3612 Dripping............ Message-ID: The 3612 Line is dripping , I've changed the Suck Back Valve but I still See the problem, I also replaced the solenoid air line and adjusted Suck Back, I need to run more wafers to see If I can trace the problem ,AS OF RIGHT NOW AVOID USING THE 3612 RESIST PROGRAMS . From vilanova at snf.stanford.edu Tue Aug 31 09:13:40 2010 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Tue, 31 Aug 2010 09:13:40 -0700 Subject: Shutdown svgcoat2 SNF 2010-08-31 09:13:39: working on 3612 Pump Problem stay tuned.......... Message-ID: From gsosa at snf.stanford.edu Tue Aug 31 14:23:33 2010 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Tue, 31 Aug 2010 14:23:33 -0700 Subject: Shutdown svgcoat2 SNF 2010-08-31 09:13:39: working on 3612 Pump Problem stay tuned.......... Message-ID: Continued working on dripping problem with 3612 resist. Replaced suckback valve- still same. Replaced resist pump and purgede lines. Checked and adjusted suckback- all looks OK. Checked spin quality and thickness-OK 1.6um Mean 1718 A Std Dev 11 A 1.0 um Mean 100333 A Std Dev 16 A Coated 10 wafers with standard 1.0 micron program. All wafers look good( No visible defects, Top EBR good, Backside clean). system is OK to use From gsosa at snf.stanford.edu Tue Aug 31 14:23:43 2010 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Tue, 31 Aug 2010 14:23:43 -0700 Subject: Problem svgcoat2 SNF 2010-08-30 11:44:59: 3612 Dripping............ Message-ID: Continued working on dripping problem with 3612 resist. Replaced suckback valve- still same. Replaced resist pump and purgede lines. Checked and adjusted suckback- all looks OK. Checked spin quality and thickness-OK 1.6um Mean 1718 A Std Dev 11 A 1.0 um Mean 100333 A Std Dev 16 A Coated 10 wafers with standard 1.0 micron program. All wafers look good( No visible defects, Top EBR good, Backside clean). system is OK to use From gsosa at snf.stanford.edu Tue Aug 31 14:23:49 2010 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Tue, 31 Aug 2010 14:23:49 -0700 Subject: Problem svgcoat2 SNF 2010-08-29 08:49:51: Same problem : 3612 nozzle drip Message-ID: Continued working on dripping problem with 3612 resist. Replaced suckback valve- still same. Replaced resist pump and purgede lines. Checked and adjusted suckback- all looks OK. Checked spin quality and thickness-OK 1.6um Mean 1718 A Std Dev 11 A 1.0 um Mean 100333 A Std Dev 16 A Coated 10 wafers with standard 1.0 micron program. All wafers look good( No visible defects, Top EBR good, Backside clean). system is OK to use From gsosa at snf.stanford.edu Tue Aug 31 14:23:54 2010 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Tue, 31 Aug 2010 14:23:54 -0700 Subject: Problem svgcoat2 SNF 2010-08-27 17:15:35: 3612 nozzle DRIPS Message-ID: Continued working on dripping problem with 3612 resist. Replaced suckback valve- still same. Replaced resist pump and purgede lines. Checked and adjusted suckback- all looks OK. Checked spin quality and thickness-OK 1.6um Mean 1718 A Std Dev 11 A 1.0 um Mean 100333 A Std Dev 16 A Coated 10 wafers with standard 1.0 micron program. All wafers look good( No visible defects, Top EBR good, Backside clean). system is OK to use From mahnaz at snf.stanford.edu Tue Aug 31 15:53:53 2010 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Tue, 31 Aug 2010 15:53:53 -0700 Subject: Problem svgcoat2 SNF 2010-08-31 15:53:53: 220-3 nonuniform Message-ID: I cleaned the nozzle and ran 3 dummies the uniformity in the center of wafers on two product wfs is out. I ran prog 4. either the chuck is not centered or the nozzle does not go to the center of wafers.