From mahnaz at snf.stanford.edu Mon May 2 15:33:07 2011 From: mahnaz at snf.stanford.edu (mahnaz at snf.stanford.edu) Date: Mon, 2 May 2011 15:33:07 -0700 Subject: Problem svgcoat2 SNF 2011-05-02 15:33:07: EBr back splash Message-ID: Ran about 15 wafers most have eBR splash, asml folks please check back of your wafers. From vilanova at snf.stanford.edu Tue May 3 08:47:11 2011 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Tue, 3 May 2011 08:47:11 -0700 Subject: Problem svgcoat2 SNF 2011-05-02 15:33:07: EBr back splash Message-ID: adjusted EBR Flow , cycled wafers , back of wafers clean . From lindaohara at snf.stanford.edu Tue May 3 10:15:54 2011 From: lindaohara at snf.stanford.edu (lindaohara at snf.stanford.edu) Date: Tue, 3 May 2011 10:15:54 -0700 Subject: Comment svgcoat2 SNF 2011-05-03 10:15:53: Hotspot Message-ID: Hotspot at 3:00 o'clock position, Joey cleaned E-Chuck, no hotspots From vilanova at snf.stanford.edu Tue May 3 13:57:14 2011 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Tue, 3 May 2011 13:57:14 -0700 Subject: Comment svgcoat2 SNF 2011-05-03 10:15:53: Hotspot Message-ID: cleared . From gsosa at snf.stanford.edu Thu May 5 14:51:13 2011 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Thu, 5 May 2011 14:51:13 -0700 Subject: Comment svgcoat2 SNF 2011-05-05 14:51:12: 955 0.7 thickness test 5/5 Message-ID: Checked the 0.7 micron resist program for SPR 955-.7 photoresist. Target thickness = 0.7 microns. Mean thickness(5 points): 7039 Angstroms, Std Dev. 12 Angstroms. Spin quality looked good. EBR looked good and backs of wafers looked clean. From sclaussen at snf.stanford.edu Mon May 9 11:22:31 2011 From: sclaussen at snf.stanford.edu (sclaussen at snf.stanford.edu) Date: Mon, 9 May 2011 11:22:31 -0700 Subject: Problem svgcoat2 SNF 2011-05-09 11:22:30: Track 2 resist alarm keeps going off Message-ID: From gsosa at snf.stanford.edu Mon May 9 14:15:24 2011 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Mon, 9 May 2011 14:15:24 -0700 Subject: Problem svgcoat2 SNF 2011-05-09 11:22:30: Track 2 resist alarm keeps going off Message-ID: Purged air bubble out of dispense line. From gsosa at snf.stanford.edu Mon May 16 13:34:18 2011 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Mon, 16 May 2011 13:34:18 -0700 Subject: Shutdown svgcoat2 SNF 2011-05-16 13:34:18: checking out exhaust system Message-ID: From vilanova at snf.stanford.edu Mon May 16 14:13:15 2011 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Mon, 16 May 2011 14:13:15 -0700 Subject: Shutdown svgcoat2 SNF 2011-05-16 13:34:18: checking out exhaust system Message-ID: cleared ( Exhaust Fan Belt has been replaced From gsosa at snf.stanford.edu Mon May 23 09:33:30 2011 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Mon, 23 May 2011 09:33:30 -0700 Subject: Comment svgcoat2 SNF 2011-05-23 09:33:30: 955 0.7 Thickness 5/23 Message-ID: Checked the 0.7 micron resist program for SPR 955-.7 photoresist. Target thickness = 0.7 microns. Mean thickness(5 points): 7015 Angstroms, Std Dev. 6 Angstroms. Spin quality looked good. EBR looked good and backs of wafers looked clean. From lilihsu at snf.stanford.edu Tue May 24 17:37:08 2011 From: lilihsu at snf.stanford.edu (lilihsu at snf.stanford.edu) Date: Tue, 24 May 2011 17:37:08 -0700 Subject: Comment svgcoat2 SNF 2011-05-24 17:37:08: thickness and uniformity test Message-ID: I did not do yes oven or any sort of prebake before running these wafers. I did run 4 dummies before coating the good wafer. 1um 3612: avg=10193, std dev=8 1.6um 3612: avg=16975, std dev=10 From sclaussen at snf.stanford.edu Tue May 24 22:53:12 2011 From: sclaussen at snf.stanford.edu (sclaussen at snf.stanford.edu) Date: Tue, 24 May 2011 22:53:12 -0700 Subject: Problem svgcoat2 SNF 2011-05-24 22:53:11: Dot in middle of wafer Message-ID: Some wafers are showing up with a dot in the middle. I'm running recipe 8 1.6um w/o VP 5mm EBR. From sclaussen at snf.stanford.edu Tue May 24 23:01:19 2011 From: sclaussen at snf.stanford.edu (sclaussen at snf.stanford.edu) Date: Tue, 24 May 2011 23:01:19 -0700 Subject: Problem svgcoat2 SNF 2011-05-24 23:01:18: EVERY process wafer has dot at the middle! Message-ID: From vilanova at snf.stanford.edu Wed May 25 08:19:13 2011 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 25 May 2011 08:19:13 -0700 Subject: Problem svgcoat2 SNF 2011-05-24 22:53:11: Dot in middle of wafer Message-ID: Cycled same Recipe ,I noticed that same problem on 3 of my wafers, NOticed that Someone had changed the resist bottle therefore there were some air bubbles in the line, Purged line cycled all dummy wafers from Box ( 14 Each ) Uniformity Looks Good On all of them , Ok to use. From vilanova at snf.stanford.edu Wed May 25 08:19:18 2011 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 25 May 2011 08:19:18 -0700 Subject: Problem svgcoat2 SNF 2011-05-24 23:01:18: EVERY process wafer has dot at the middle! Message-ID: Cycled same Recipe ,I noticed that same problem on 3 of my wafers, NOticed that Someone had changed the resist bottle therefore there were some air bubbles in the line, Purged line cycled all dummy wafers from Box ( 14 Each ) Uniformity Looks Good On all of them , Ok to use. From sclaussen at snf.stanford.edu Wed May 25 10:48:29 2011 From: sclaussen at snf.stanford.edu (sclaussen at snf.stanford.edu) Date: Wed, 25 May 2011 10:48:29 -0700 Subject: Problem svgcoat2 SNF 2011-05-25 10:48:29: Dot still appearing in center of wafers Message-ID: From vilanova at snf.stanford.edu Wed May 25 13:20:46 2011 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Wed, 25 May 2011 13:20:46 -0700 Subject: Problem svgcoat2 SNF 2011-05-25 10:48:29: Dot still appearing in center of wafers Message-ID: we have cycled many wafers ( Recipe # 8 ) and the uniformity Results is Good , We beleive that there MIght be a problem with the user wafers, Ok to Use.