Problem svgdev 2003-07-09 21:53:57: Wetting of thick photoresist

zappe at zappe at
Wed Jul 9 09:54:01 PDT 2003

Could a spray step (spray2) be added at the beginning of prog. #6 (development of thick photoresist SPR220-7, SPR220-3) so that the whole wafer surface is covered with developer after the first stream2 step ?
Right now I have to use the nitrogen gun to distribute the liquid because of remaining dry spots otherwise.
Thanks !

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