Comment svgdev SNF 2007-10-06 14:10:05: i-line resist develop good

gibby at snf.stanford.edu gibby at snf.stanford.edu
Sat Oct 6 14:10:05 PDT 2007


This time the i-line resist develop was good.  1 um 955 resist, standard develop program.  Resist on TiN.  Exposure 130 mj/cm2, focus -02. um.




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