Problem svgdev2 2003-07-09 21:54:45: Wetting of thick photoresist

zappe at snf.stanford.edu zappe at snf.stanford.edu
Wed Jul 9 09:54:45 PDT 2003


Could a spray step (spray2) be added at the beginning of prog. #6 (development of thick photoresist SPR220-7, SPR220-3) so that the whole wafer surface is covered with developer after the first stream2 step ?
Right now I have to use the nitrogen gun to distribute the liquid because of remaining dry spots otherwise.
Thanks !




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