Comment svgdev2 SNF 2007-11-14 14:48:38: Program 5 Develop results

gibby at snf.stanford.edu gibby at snf.stanford.edu
Wed Nov 14 14:48:38 PST 2007

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Ran program 5 without problems.  1um 955 resist; smallest feature resolved: 0.35 um.  Exposure: ASML, 130 mJ/cm2, -0.2 um focus offset.  Uniform coat, exposure, development.

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