From haniff at snf.stanford.edu Wed Jun 17 17:56:38 2009 From: haniff at snf.stanford.edu (haniff at snf.stanford.edu) Date: Wed, 17 Jun 2009 17:56:38 -0700 Subject: Problem svgdev2 SNF 2009-06-17 17:56:37: no programs Message-ID: I help user cursive get his stuck wafer of the track and reset the power. It seems like the programs were lost when we turned the power back on. From haniff at snf.stanford.edu Wed Jun 17 18:04:33 2009 From: haniff at snf.stanford.edu (haniff at snf.stanford.edu) Date: Wed, 17 Jun 2009 18:04:33 -0700 Subject: Comment svgdev2 SNF 2009-06-17 18:04:32: lost programs Message-ID: I was wrong. the programs are still there but for some reason step 1 of bake program1 is "end". From calarrudo at snf.stanford.edu Wed Jun 17 21:09:08 2009 From: calarrudo at snf.stanford.edu (calarrudo at snf.stanford.edu) Date: Wed, 17 Jun 2009 21:09:08 -0700 Subject: Problem svgdev2 SNF 2009-06-17 21:09:07: Message-ID: Developer Track 2 will not bake wafers.... From vilanova at snf.stanford.edu Thu Jun 18 07:30:32 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Thu, 18 Jun 2009 07:30:32 -0700 Subject: Problem svgdev2 SNF 2009-06-17 21:09:07: Message-ID: Someone Deleted Bake program 1, I checked all of the rest of the Bake programs and they were ok, I put back the bake program on bake program # 1 and tested, bake station working Fine, Ready to use. From vilanova at snf.stanford.edu Thu Jun 18 07:30:53 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Thu, 18 Jun 2009 07:30:53 -0700 Subject: Comment svgdev2 SNF 2009-06-17 18:04:32: lost programs Message-ID: Please read previous message. From vilanova at snf.stanford.edu Thu Jun 18 07:31:09 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Thu, 18 Jun 2009 07:31:09 -0700 Subject: Problem svgdev2 SNF 2009-06-17 17:56:37: no programs Message-ID: Please read previous message. From lwchang at snf.stanford.edu Thu Jun 18 18:39:45 2009 From: lwchang at snf.stanford.edu (lwchang at snf.stanford.edu) Date: Thu, 18 Jun 2009 18:39:45 -0700 Subject: Problem svgdev2 SNF 2009-06-18 18:39:44: HP prog 1 is not baking wafer... Message-ID: From gsosa at snf.stanford.edu Fri Jun 19 07:28:18 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 19 Jun 2009 07:28:18 -0700 Subject: Shutdown svgdev2 SNF 2009-06-19 07:28:18: Reprogramming Message-ID: Entering in programs for LDD26W Dveloper. From vilanova at snf.stanford.edu Fri Jun 19 07:29:10 2009 From: vilanova at snf.stanford.edu (vilanova at snf.stanford.edu) Date: Fri, 19 Jun 2009 07:29:10 -0700 Subject: Problem svgdev2 SNF 2009-06-18 18:39:44: HP prog 1 is not baking wafer... Message-ID: SOmeone Is deleting the bake Step for program # 1 , Stop doing this!!! If you want to skeep the bake just Use program #9 or if you change it at least change it back bake that way the rest of the users will not have any problems, I Just put back the bake step and We'll keep an eye on the Users history to see whos doing it. From gsosa at snf.stanford.edu Fri Jun 19 09:47:14 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 19 Jun 2009 09:47:14 -0700 Subject: Shutdown svgdev2 SNF 2009-06-19 07:28:18: Reprogramming Message-ID: Completed programming changes as per program sheets. Develop programs 3, 4, 6 and 7 develop puddle times changed and dispense changed to LDD26W developer. These programs are used for Shipley 3612 1 micron, 1.6 micron, 3 micron and 7 micron resist processing. Programs 2 and 5 are the same . They use the MF26A developer for I-line processing with the Shipley 955-7 photo-resist. Please continue to use the programming guide to verify programs. From gsosa at snf.stanford.edu Fri Jun 19 09:48:16 2009 From: gsosa at snf.stanford.edu (gsosa at snf.stanford.edu) Date: Fri, 19 Jun 2009 09:48:16 -0700 Subject: Comment svgdev2 SNF 2009-06-19 09:48:15: Developer Update 6/19 Message-ID: Completed programming changes as per program sheets. Develop programs 3, 4, 6 and 7 develop puddle times changed and dispense changed to LDD26W developer. These programs are used for Shipley 3612 1 micron, 1.6 micron, 3 micron and 7 micron resist processing. Programs 2 and 5 are the same . They use the MF26A developer for I-line processing with the Shipley 955-7 photo-resist. Please continue to use the programming guide to verify programs.