Shutdown svgdev2 SNF 2009-06-19 07:28:18: Reprogramming

gsosa at snf.stanford.edu gsosa at snf.stanford.edu
Fri Jun 19 09:47:14 PDT 2009


Completed programming changes as per program sheets. Develop programs 3, 4, 6 and 7 develop puddle times changed and dispense changed to LDD26W developer. These programs are used for Shipley 3612 1 micron, 1.6 micron, 3 micron and 7 micron resist processing. Programs 2 and 5 are the same . They use the MF26A developer for I-line processing with the Shipley 955-7 photo-resist. Please continue to use the programming guide to verify programs.  




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