Comment svgdev2 SNF 2009-09-04 12:53:21: potential problem

yeh at snf.stanford.edu yeh at snf.stanford.edu
Fri Sep 4 12:53:22 PDT 2009


litho process that used to work is under exposing or developing.
process:
-svgcoat2, 1um 3612 resist
-1.5sec exposure at KarlSuss2, soft contact mode
- svgdev prog. 3/bake 1.
this process has worked many times in the past but both my wafers today had resist in the edge dies where it should be exposed/developed.
suspect either the resist coater is giving thicker films and/or KS2 UV lamp has reduced intensity than normal.




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