teos2 dep rate?
cmcg at stanford.edu
Sat May 31 12:19:19 PDT 2008
Has anyone noticed inconsistent dep rate from teos 2? I typically measure
35-40A/min, averaged across the wafer and across the tube. Occasionally I
have noticed this value dropping to tens of A/min and up to 55A/min. The
symptoms seem to be low chamber pressure in some cases, and teos2 gas
running low in others. I am curious if other people have noticed similarly
unpredictable behavior, and if this is a concern or not. It is very
important for me to achieve controllable oxide layer thicknesses, so is
important to me. Any thoughts on how to improve the consistency?
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