Comment thermconitride1 SNF 2012-12-10 11:10:41: Residual stress LSNTEST

karthikv at snf.stanford.edu karthikv at snf.stanford.edu
Sun Dec 23 09:25:50 PST 2012


Processed 4 wafers (1:15 hr) with LSNTEST to obtain 597 nm +- 38 nm film thickness and a residual stress of 22.4 MPa.



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