Problem thermcopoly1 SNF 2009-02-13 01:09:10: process pressure .441 & non uniform run

ajamo at snf.stanford.edu ajamo at snf.stanford.edu
Fri Feb 13 01:09:11 PST 2009


 Used recipe P525POLY  for 1 hr and 8 min.  target thk is 1000 A poly on 1000 Oxide.  Wafers in front boat behind 2 dummies (tight pack) came out ave 750A poly and wafers in back boat came out 950A poly.  Base pressure good 13mtorr, Leak 63 mtorr, dep pressure 441mtorr from back panel . The rest of the logbook dep pressure was ~200mtorr.




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