Comment thermcopoly1 SNF 2010-03-04 01:16:46: Test completed: OK

king at snf.stanford.edu king at snf.stanford.edu
Thu Mar 4 01:16:46 PST 2010


I ran my usual deposition and anneal recipes on two thermal oxide test wafers and the result was within a normal range. Dep conditions were  P580PH3; 4sccm PH3; 46.5 min.  Annealed 30 min at 950C,.  Stripped surface oxide.  Thickness = 762A  with 130 ohm/sq. 




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