Problem thermcopoly1 SNF 2011-05-23 07:24:29: SiH4 flow and other alarm

jprovine at snf.stanford.edu jprovine at snf.stanford.edu
Mon May 23 07:24:30 PDT 2011


running P620POLY recipe, the system alarmed in deposition step for SiH4 flow problem...set point is 150sccm but actual flow is 1.00 sccm.
wafers still in furnace and furnace at low pressure waiting to stabilize parameters.




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