Problem thermcopoly1 SNF 2011-09-08 21:39:05: No Ge deposition

[chienyuc at snf.stanford.edu]

Ran recipe PGE twice (yesterday and today) on bare Si and oxide dummy.  Found there is no Ge deposition.  Conditions are given below:
GeH4=20 sccm, 300C, 400mtorr for 3 hours.  Same recipe works in thermcopoly2 before.
No flow or temperature problem found during the whole process.