questions for thermcopoly1 P620B2H6 recipe

[Robin King]

Hi Qiushi,

Did you anneal the wafers afterward?  


Best,
Robin King / IBM



________________________________
From: Qiushi (Helen) Ran <qran at stanford.edu>
To: thermcopoly1 at snf.stanford.edu
Sent: Monday, October 24, 2011 7:53 PM
Subject: questions for thermcopoly1 P620B2H6 recipe

Hi, guys, 
Sorry to spam all. I have a question for P620B2H6 recipe. I ran this recipe for 40min with B2H6 gas flow 10. The thickness of the polysilicon is 400nm as expected. However, I measured the resistance of the film by using Prometrix, it is around 370 ohm/sq. This result is quite different from the calibrate result on SNF's website (69 ohm/sq). Does anyone know why there is a big difference?
Any comments, suggestions are welcome. 
Thanks, 
Helen 

Qiushi(Helen) Ran
=========================================
Department of Electrical Engineering
Stanford University, Stanford, CA 94305.
Mobile: +1-650-796-1439
Email: qran at stanford.edu 
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