questions for thermcopoly1 P620B2H6 recipe
robinhmb at yahoo.com
Mon Oct 24 20:36:23 PDT 2011
Did you anneal the wafers afterward?
Robin King / IBM
From: Qiushi (Helen) Ran <qran at stanford.edu>
To: thermcopoly1 at snf.stanford.edu
Sent: Monday, October 24, 2011 7:53 PM
Subject: questions for thermcopoly1 P620B2H6 recipe
Sorry to spam all. I have a question for P620B2H6 recipe. I ran this recipe for 40min with B2H6 gas flow 10. The thickness of the polysilicon is 400nm as expected. However, I measured the resistance of the film by using Prometrix, it is around 370 ohm/sq. This result is quite different from the calibrate result on SNF's website (69 ohm/sq). Does anyone know why there is a big difference?
Any comments, suggestions are welcome.
Department of Electrical Engineering
Stanford University, Stanford, CA 94305.
Email: qran at stanford.edu
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