From tberg at stanford.edu  Wed Jan 28 12:02:16 2009
From: tberg at stanford.edu (Ted Berg)
Date: Wed, 28 Jan 2009 12:02:16 -0800
Subject: [Fwd: B2h6  is going away]
Message-ID: <4980B9C8.9030403@stanford.edu>



-------- Original Message --------
Subject: 	B2h6 is going away
Date: 	Wed, 28 Jan 2009 12:00:42 -0800
From: 	Ted Berg <tberg at stanford.edu>
To: 	thermcopoly at snf.stanford.edu, Mary Tang <mtang at snf.stanford.edu>, 
Jim McVittie <mcvittie at cis.Stanford.EDU>, John Shott 
<shott at snf.stanford.edu>, Ray Seymour <seymour at snf.stanford.edu>



Hello All,
   Just another reminder to B2H6 users on Thermco Polys. The B2H6 mix 
we are currently using is in H2 , in order to comply with EH7S 
requirements we are going to be switching to B2 H6 in N2. Does anyone 
have any conncerns/comments regarding this switch. Please respond 
quickly as it will be happening soon. Thanks,ted


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From eap at gloworm.Stanford.EDU  Thu Jan 29 20:36:19 2009
From: eap at gloworm.Stanford.EDU (Eric Perozziello)
Date: Thu, 29 Jan 2009 20:36:19 -0800 (PST)
Subject: [Fwd: B2h6  is going away]
In-Reply-To: <4980B9C8.9030403@stanford.edu>
Message-ID: <Pine.GSO.4.44.0901292028340.3317-100000@gloworm.Stanford.EDU>


Of course it's a concern, because the process will be
completely changed.

Aside from deposition rates and doping incorporation,
I believe that the use of N2 as a diluent may shift the
process into the mass-transport-limited regime.
This would likely give less conformal films.

It sounds like it's a forced change (is that right?).
If so, I guess the best that we can do is work
around it-  it might be good to baseline our current
process (including trench/via fill) and compare it
to the new process.  It might be that a lower temperature
"standard" deposition is more useful in the new
chemistry.

How soon?  Any chance of getting a trench/via wafer
test?

Thanks,
-Eric


On Wed, 28 Jan 2009, Ted Berg wrote:

>
>
> -------- Original Message --------
> Subject: 	B2h6 is going away
> Date: 	Wed, 28 Jan 2009 12:00:42 -0800
> From: 	Ted Berg <tberg at stanford.edu>
> To: 	thermcopoly at snf.stanford.edu, Mary Tang <mtang at snf.stanford.edu>,
> Jim McVittie <mcvittie at cis.Stanford.EDU>, John Shott
> <shott at snf.stanford.edu>, Ray Seymour <seymour at snf.stanford.edu>
>
>
>
> Hello All,
>    Just another reminder to B2H6 users on Thermco Polys. The B2H6 mix
> we are currently using is in H2 , in order to comply with EH7S
> requirements we are going to be switching to B2 H6 in N2. Does anyone
> have any conncerns/comments regarding this switch. Please respond
> quickly as it will be happening soon. Thanks,ted
>
>
>