Problem tylan1 SNF 2008-11-18 06:10:49: nonuniformity observed

ywidjaja at snf.stanford.edu ywidjaja at snf.stanford.edu
Tue Nov 18 06:10:49 PST 2008


I ran wet850 and found the oxide thickness to be non-uniform.  Dry ox seems to be fine.  Please let me know if you also encounter a similar issue.
Here's the wet oxidation results across 3 wafers (front, middle, back) -- expect ~2200A:
	#front	#middle	#back
top	1923	2722	2750
center	1972	2088	2338
bottom	2040	2079	2501
left	2100	2369	2923
right	2050	2692	3090




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