From ahazeghi at stanford.edu  Thu Feb 14 15:17:23 2008
From: ahazeghi at stanford.edu (Arash Hazeghi)
Date: Thu, 14 Feb 2008 15:17:23 -0800
Subject: which recipe for thin oxide
Message-ID: <004501c86f5f$c13c7440$43b55cc0$@edu>

Folks,

I want to grow 100~150A  high quality oxide on 100 P-substrate, do you have
an idea which recipe will give best uniformity across the wafer? Iin the
past I have used wet recipe with OK results but for way thicker oxides.

 

Thanks,

Arash

 

 

 

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From ahazeghi at stanford.edu  Thu Feb 28 20:07:35 2008
From: ahazeghi at stanford.edu (Arash Hazeghi)
Date: Thu, 28 Feb 2008 20:07:35 -0800
Subject: Thin oxide measurement 
Message-ID: <012901c87a88$9d445060$d7ccf120$@edu>

Greetings,

 

I have used DRY900 recipe @ 39min to grow ~150A oxide on <100> substrate, I
used nanospec (both of them) to measure thickness using my control wafer
(which didn't go through oxidation) for calibration. On nanospec if I use
the thin oxide on silicon option, I get ~132-143A across the wafer and if I
use regular oxide on silicon I get 170~180A. Which one is more accurate/how
can I measure oxide thickness more accurately?

 

 

 

Thanks,

 

Arash

 

 

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From jimkruger at yahoo.com  Thu Feb 28 21:06:27 2008
From: jimkruger at yahoo.com (jim kruger)
Date: Thu, 28 Feb 2008 21:06:27 -0800 (PST)
Subject: Thin oxide measurement 
In-Reply-To: <012901c87a88$9d445060$d7ccf120$@edu>
Message-ID: <742235.29064.qm@web38901.mail.mud.yahoo.com>

The NanoSpec ThinOxide program has a very simple
model, just measuring reflectance at a single
wavelength.  It is not very accurate, easily confused
by e.g. roughness.
The NanoSpec Oxide/Si program does measure reflectance
over a range of wavelengths and gives good numbers for
thickness' over 1000Ang.  I am more suspicious of
values between 100 and 1000Ang.

For thickness' less than  about 1000 Ang, you should
use an ellipsometer, either the older Rudolf or the
fancy new J. A.  Woolam which is one of the few tools
we have at SNF that is State of the Art.

Uli can train you an the Rudolf or Ed Myers on the
Woolam.

jimkruger

--- Arash Hazeghi <ahazeghi at stanford.edu> wrote:

> Greetings,
> 
>  
> 
> I have used DRY900 recipe @ 39min to grow ~150A
> oxide on <100> substrate, I
> used nanospec (both of them) to measure thickness
> using my control wafer
> (which didn't go through oxidation) for calibration.
> On nanospec if I use
> the thin oxide on silicon option, I get ~132-143A
> across the wafer and if I
> use regular oxide on silicon I get 170~180A. Which
> one is more accurate/how
> can I measure oxide thickness more accurately?
> 
>  
> 
>  
> 
>  
> 
> Thanks,
> 
>  
> 
> Arash
> 
>  
> 
>  
> 
> 



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