Thin Oxide

Arash Hazeghi ahazeghi at stanford.edu
Tue Feb 3 13:27:12 PST 2009


Last year is a long time ago,  back then I was getting good results as well
but from Oct. 2008 I was not able to grow anything below 30nm with
acceptable uniformity, attached is the thickness measurement for 5 wafers
with target thickness 30nm, non-uniformity is as high as 10%.

Thanks,
Arash




-----Original Message-----
From: Takane Usui [mailto:takane at stanford.edu] 
Sent: Tuesday, February 03, 2009 1:19 PM
To: Arash Hazeghi
Cc: 'Nancy Latta'; yoonyoung at snf.stanford.edu
Subject: Re: Thin Oxide

I grew 10nm oxide several times last year with DRY750.  Uniformity from 
our TEM images was pretty ok.
-Takane
Prinz Group

Arash Hazeghi wrote:
> Nancy,
> Last time I ran Tylan 2 for 20nm oxide (DRY900) uniformity was horrible,
has
> the furnace been fixed since then? 
>
> Thanks,
> Arash
>
> -----Original Message-----
> From: Nancy Latta [mailto:nlatta at stanford.edu] 
> Sent: Tuesday, February 03, 2009 1:00 PM
> To: tylan1 at snf.stanford.edu
> Subject: Thin Oxide
>
> Folks,
>
> Is anyone running tylan1 or 2 for 10nm oxides?  If so, can you which 
> furnace, temp and time to yoonyoung at snf.stanford.edu?
>
> Thanks in advance,
>
> -Nancy
>
>
>
>   
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