ahazeghi at stanford.edu
Tue Feb 3 13:27:12 PST 2009
Last year is a long time ago, back then I was getting good results as well
but from Oct. 2008 I was not able to grow anything below 30nm with
acceptable uniformity, attached is the thickness measurement for 5 wafers
with target thickness 30nm, non-uniformity is as high as 10%.
From: Takane Usui [mailto:takane at stanford.edu]
Sent: Tuesday, February 03, 2009 1:19 PM
To: Arash Hazeghi
Cc: 'Nancy Latta'; yoonyoung at snf.stanford.edu
Subject: Re: Thin Oxide
I grew 10nm oxide several times last year with DRY750. Uniformity from
our TEM images was pretty ok.
Arash Hazeghi wrote:
> Last time I ran Tylan 2 for 20nm oxide (DRY900) uniformity was horrible,
> the furnace been fixed since then?
> -----Original Message-----
> From: Nancy Latta [mailto:nlatta at stanford.edu]
> Sent: Tuesday, February 03, 2009 1:00 PM
> To: tylan1 at snf.stanford.edu
> Subject: Thin Oxide
> Is anyone running tylan1 or 2 for 10nm oxides? If so, can you which
> furnace, temp and time to yoonyoung at snf.stanford.edu?
> Thanks in advance,
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