From xzhuan1 at snf.stanford.edu Sun Feb 12 19:25:39 2006 From: xzhuan1 at snf.stanford.edu (xzhuan1 at snf.stanford.edu) Date: Sun, 12 Feb 2006 19:25:39 -0800 Subject: Problem tylan3 SNF 2006-02-12 19:25:38: poor oxide uniformity Message-ID: over 10% variation in oxide thickness in a single wafer with oxide thickness of 4500A. Also the oxide film is much thinner than expected thickness of 6100A. From mdickey at snf.stanford.edu Mon Feb 13 07:55:06 2006 From: mdickey at snf.stanford.edu (mdickey at snf.stanford.edu) Date: Mon, 13 Feb 2006 07:55:06 -0800 Subject: Comment tylan3 SNF 2006-02-13 07:55:05: test Message-ID: Replaced injector .....needs test From maurice at snf.stanford.edu Tue Feb 14 15:10:21 2006 From: maurice at snf.stanford.edu (maurice at snf.stanford.edu) Date: Tue, 14 Feb 2006 15:10:21 -0800 Subject: Problem tylan3 SNF 2006-02-12 19:25:38: poor oxide uniformity Message-ID: logged From maurice at snf.stanford.edu Tue Feb 14 15:11:22 2006 From: maurice at snf.stanford.edu (maurice at snf.stanford.edu) Date: Tue, 14 Feb 2006 15:11:22 -0800 Subject: Problem tylan3 SNF 2006-02-14 15:11:21: non uniform oxide Message-ID: over 6.5% variation in oxide thickness in a single wafer with oxide thickness of 850A. Also the oxide film is much thinner than expected thickness of 1000A. From maurice at snf.stanford.edu Tue Feb 14 15:12:46 2006 From: maurice at snf.stanford.edu (maurice at snf.stanford.edu) Date: Tue, 14 Feb 2006 15:12:46 -0800 Subject: Comment tylan3 SNF 2006-02-13 07:55:05: test Message-ID: expected 1000A...actual ~850...uniformity6.5% From maurice at snf.stanford.edu Thu Feb 16 18:40:45 2006 From: maurice at snf.stanford.edu (maurice at snf.stanford.edu) Date: Thu, 16 Feb 2006 18:40:45 -0800 Subject: Problem tylan3 SNF 2006-02-14 15:11:21: non uniform oxide Message-ID: Gladys' test after Mike adjusted door was good