From gaul at snf.stanford.edu Mon Jun 19 14:04:35 2000 From: gaul at snf.stanford.edu (Keith Gaul) Date: Mon, 19 Jun 2000 14:04:35 -0700 Subject: LPCVD's will be down tomorrow Message-ID: <394E8AE3.7CB617ED@snf.stanford.edu> The burnbox that supports the diffusion area LPCVD's needs a major cleaning tomorrow. It will be shutdown tomorrow morning around 6 a.m. and should be back up early in the afternoon. Keith From mcvittie at cis.Stanford.EDU Mon Jun 19 15:39:22 2000 From: mcvittie at cis.Stanford.EDU (Jim McVittie) Date: Mon, 19 Jun 2000 15:39:22 -0700 (PDT) Subject: TEOS Oxide Deposition Pole Message-ID: LTO Users, The TEOS tube is presently down. I would like to find out what the interest among users is for getting it back up. The advantage of TEOS over LTO is that its effective sticking coefficient is about 10x lower which means it has much better step coverage than LTO. The disadvantage is that the deposition temperature 700C. I believe the dep rates are about the same. Please let me know by email, if you plan on using the TEOS Deposition Tube when it comes up. It will not come up very fast if there is not much interest in using it. Thanks, Jim -------------------------------------------------------------- James P. McVittie, Ph.D. Senior Research Scientist Rm. 336 jmcvittie at stanford.edu Allen Center for Integrated Systems Tel: (650) 725-3640 Stanford University Fax: (650) 723-4659 330 Serra Mall For packages: CISX Receiving Stanford, CA 94305-4075 Via Ortega Stanford, CA 94305-4075