TEOS Oxide Deposition Pole

Jim McVittie mcvittie at cis.Stanford.EDU
Mon Jun 19 15:39:22 PDT 2000


LTO Users, 

The TEOS tube is presently down. I would like to find out what the
interest among users is for getting it back up. The advantage of TEOS over
LTO is that its effective sticking coefficient is about 10x lower which
means it has much better step coverage than LTO. The disadvantage is that
the deposition temperature 700C. I believe the dep rates are about the
same. Please let me know by email, if you plan on using the TEOS
Deposition Tube when it comes up. It will not come up very fast if there
is not much interest in using it.

Thanks,			Jim 	
--------------------------------------------------------------
James P. McVittie, Ph.D.                Senior Research Scientist
Rm. 336            			jmcvittie at stanford.edu
Allen Center for Integrated Systems	Tel: (650) 725-3640	
Stanford University			Fax: (650) 723-4659
330 Serra Mall		  For packages: CISX Receiving
Stanford, CA 94305-4075			Via Ortega
					Stanford, CA 94305-4075




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