From wtpark at stanford.edu Fri Nov 14 08:38:12 2003 From: wtpark at stanford.edu (Woo-Tae Park) Date: Fri, 14 Nov 2003 08:38:12 -0800 Subject: tylanbpsg free from 11:30AM to 4:30PM today Message-ID: <1068827892.3fb504f43c3ed@webmail> I hope the problem is fixed before this. Woo-Tae From tkramer at stanford.edu Fri Nov 14 19:15:14 2003 From: tkramer at stanford.edu (Theresa Kramer) Date: Fri, 14 Nov 2003 19:15:14 -0800 (PST) Subject: thin LTO questions Message-ID: Hi, I have two questions about thin LTO and pinholes. We would like to put aluminum pads over deposited oxide which is 10s of nanometers thick, or less (ideally). Does anyone have experience with thin LTO and know a minimum thickness where pinholes become a problem? How about as deposited or following a densification step? Are we crazy to even contemplate this type of structure? Also, we are wondering how thin the LTO could be before probes landed gently on the 200nm aluminum would pierce the oxide underneath. If anyone has experience with either of these issues, I would greatly appreciate your advice. Thanks, Theresa From wtpark at stanford.edu Wed Nov 19 22:12:29 2003 From: wtpark at stanford.edu (Woo-Tae Park) Date: Wed, 19 Nov 2003 22:12:29 -0800 Subject: removed reservation tomorrow 3PM to 11PM Message-ID: <1069308749.3fbc5b4d6db72@webmail>