From xiajing at stanford.edu Wed Sep 1 01:07:50 2004 From: xiajing at stanford.edu (Jing Xia) Date: Wed, 1 Sep 2004 01:07:50 -0700 Subject: same problem as arvind's Message-ID: <1094026070.413583566b87c@webmail.stanford.edu> I tried lonh387 and nitride2 and had the same leak check problem. Nither of them worked. They both jumped directly from 35 to 115/110. From maurice at snf.stanford.edu Wed Sep 8 13:39:09 2004 From: maurice at snf.stanford.edu (Maurice Stevens) Date: Wed, 08 Sep 2004 13:39:09 -0700 Subject: 1:30 res cancelled:nitride free today Message-ID: <413F6DED.5090008@snf.stanford.edu> From curlwang at stanford.edu Tue Sep 21 18:05:04 2004 From: curlwang at stanford.edu (Ke Wang) Date: Tue, 21 Sep 2004 18:05:04 -0700 (PDT) Subject: tylannitride Message-ID: Hello dear tylannitride users, I saw reports from fengj on the maintenance page that large number of particles were found in all of his recent depositions. I'm wondering if other people are experiencing the same problem these days? I have a run on Thursday which is kind of important to me, and I really don't want to mess up. So if you have taken a look of your film under microscope, or willing to bother to do so, please, please let me (us) know how it looks like. Maurice, any comment on this? Thanks a lot!! Ke _____________________________________________ Ke Wang PHD Candidate Department of Applied Physics, Stanford University CISX B113-14 Stanford, CA 94305-4070 Phone: (650)723-8040 From maurice at snf.stanford.edu Tue Sep 21 18:12:34 2004 From: maurice at snf.stanford.edu (Maurice Stevens) Date: Tue, 21 Sep 2004 18:12:34 -0700 Subject: tylannitride In-Reply-To: References: Message-ID: <4150D182.7010302@snf.stanford.edu> I have a training tomorrow afternoon and we will see if it is still a problem. I plan on running Nitride2. I'll keep you all updated. -m Ke Wang wrote: >Hello dear tylannitride users, > >I saw reports from fengj on the maintenance page that large number of >particles were found in all of his recent depositions. I'm wondering if >other people are experiencing the same problem these days? I have a run on >Thursday which is kind of important to me, and I really don't want to mess >up. So if you have taken a look of your film under microscope, or willing >to bother to do so, please, please let me (us) know how it looks like. > >Maurice, any comment on this? > >Thanks a lot!! > >Ke > > >_____________________________________________ >Ke Wang >PHD Candidate >Department of Applied Physics, Stanford University > >CISX B113-14 >Stanford, CA 94305-4070 > >Phone: (650)723-8040 > > -- maurice at stanford.edu Maurice Stevens Stanford Nanofabrication Facility CIS Room 142, Mail Code 4070 Stanford, CA 94305 P. (650)725-3660 F. (650)725.6278 From erhan.ata at gmems.com Tue Sep 21 23:55:44 2004 From: erhan.ata at gmems.com (Erhan Ata) Date: Tue, 21 Sep 2004 23:55:44 -0700 (PDT) Subject: tylannitride In-Reply-To: <4150D182.7010302@snf.stanford.edu> Message-ID: <20040922065544.18318.qmail@web61105.mail.yahoo.com> I did a low stress run (NEWLSN). and film seems OK under microscope (either bright and dark fields), with occasional spots which may be due to my mishandling during tranport. Erhan --- Maurice Stevens wrote: > I have a training tomorrow afternoon and we will see > if it is still a > problem. I plan on running Nitride2. I'll keep you > all updated. > > -m > > Ke Wang wrote: > > >Hello dear tylannitride users, > > > >I saw reports from fengj on the maintenance page > that large number of > >particles were found in all of his recent > depositions. I'm wondering if > >other people are experiencing the same problem > these days? I have a run on > >Thursday which is kind of important to me, and I > really don't want to mess > >up. So if you have taken a look of your film under > microscope, or willing > >to bother to do so, please, please let me (us) know > how it looks like. > > > >Maurice, any comment on this? > > > >Thanks a lot!! > > > >Ke > > > > > >_____________________________________________ > >Ke Wang > >PHD Candidate > >Department of Applied Physics, Stanford University > > > >CISX B113-14 > >Stanford, CA 94305-4070 > > > >Phone: (650)723-8040 > > > > > > -- > maurice at stanford.edu > > Maurice Stevens > Stanford Nanofabrication Facility > CIS Room 142, Mail Code 4070 > Stanford, CA 94305 > P. (650)725-3660 > F. (650)725.6278 > > > ===== From xiajing at stanford.edu Wed Sep 22 02:36:53 2004 From: xiajing at stanford.edu (Jing Xia) Date: Wed, 22 Sep 2004 02:36:53 -0700 Subject: tylannitride In-Reply-To: Message-ID: <000a01c4a087$b1c67920$14880c80@JINGLAPTOP> HI, I did a lonh378 run tonight. The result seems to be ok, no particles found under microscope. Jing > -----Original Message----- > From: Ke Wang [mailto:curlwang at stanford.edu] > Sent: Tuesday, September 21, 2004 6:05 PM > To: tylannitride at snf.stanford.edu > Subject: tylannitride > > > Hello dear tylannitride users, > > I saw reports from fengj on the maintenance page that large > number of particles were found in all of his recent > depositions. I'm wondering if other people are experiencing > the same problem these days? I have a run on Thursday which > is kind of important to me, and I really don't want to mess > up. So if you have taken a look of your film under > microscope, or willing to bother to do so, please, please let > me (us) know how it looks like. > > Maurice, any comment on this? > > Thanks a lot!! > > Ke > > > _____________________________________________ > Ke Wang > PHD Candidate > Department of Applied Physics, Stanford University > > CISX B113-14 > Stanford, CA 94305-4070 > > Phone: (650)723-8040 > From ami at appnano.com Wed Sep 22 07:18:13 2004 From: ami at appnano.com (Ami Chand) Date: Wed, 22 Sep 2004 07:18:13 -0700 Subject: tylannitride In-Reply-To: Message-ID: <000501c4a0ae$fee969c0$c700a8c0@achand> I ran NEWLSN 1000A. There were no particles. ami -----Original Message----- From: Ke Wang [mailto:curlwang at stanford.edu] Sent: Tuesday, September 21, 2004 6:05 PM To: tylannitride at snf.stanford.edu Subject: tylannitride Hello dear tylannitride users, I saw reports from fengj on the maintenance page that large number of particles were found in all of his recent depositions. I'm wondering if other people are experiencing the same problem these days? I have a run on Thursday which is kind of important to me, and I really don't want to mess up. So if you have taken a look of your film under microscope, or willing to bother to do so, please, please let me (us) know how it looks like. Maurice, any comment on this? Thanks a lot!! Ke _____________________________________________ Ke Wang PHD Candidate Department of Applied Physics, Stanford University CISX B113-14 Stanford, CA 94305-4070 Phone: (650)723-8040 From ychliu at stanford.edu Wed Sep 22 08:57:21 2004 From: ychliu at stanford.edu (Yaocheng Liu) Date: Wed, 22 Sep 2004 08:57:21 -0700 Subject: tylannitride In-Reply-To: <000501c4a0ae$fee969c0$c700a8c0@achand> Message-ID: Thanks for the update. It would be great if there were no particles as reported by the last three users. Here I would like to clarify the method we usually use to detect the particles. With an optical microscope, we first have to make a good focus on the wafer surface, then switch to dark field and MAXIMIZE the lamp intensity of the microscope. If there are particles, we'll see "stars in the sky". The method is very easy but you would not be able to see the particles (even if they exist) if you don't do a good focus or don't maximize the lamp intensity. We actually found the particle problem with tylannitride about two years ago. A lot of efforts have been put there to solve this problem. I'm not sure if a permanent solution has been found. Yaocheng -----Original Message----- From: Ami Chand [mailto:ami at appnano.com] Sent: Wednesday, September 22, 2004 7:18 AM To: 'Ke Wang'; tylannitride at snf.stanford.edu Subject: RE: tylannitride I ran NEWLSN 1000A. There were no particles. ami -----Original Message----- From: Ke Wang [mailto:curlwang at stanford.edu] Sent: Tuesday, September 21, 2004 6:05 PM To: tylannitride at snf.stanford.edu Subject: tylannitride Hello dear tylannitride users, I saw reports from fengj on the maintenance page that large number of particles were found in all of his recent depositions. I'm wondering if other people are experiencing the same problem these days? I have a run on Thursday which is kind of important to me, and I really don't want to mess up. So if you have taken a look of your film under microscope, or willing to bother to do so, please, please let me (us) know how it looks like. Maurice, any comment on this? Thanks a lot!! Ke _____________________________________________ Ke Wang PHD Candidate Department of Applied Physics, Stanford University CISX B113-14 Stanford, CA 94305-4070 Phone: (650)723-8040 From cm_richter at att.net Wed Sep 22 11:13:13 2004 From: cm_richter at att.net (cm_richter at att.net) Date: Wed, 22 Sep 2004 18:13:13 +0000 Subject: tylannitride Message-ID: <092220041813.235.4151C0B8000E1F28000000EB21602806519D0A9B080C079DA1030C@att.net> I use the same method that Yahocheng uses to detect particles for nitride film inspection. I have had the same experience as Ke's in the past year or so where I have seen a number of particles non-uniformly distributed on the wafer surface using a microscope with dark field. I used the NEWLSN and LONH378 recipes. Claudia -------------- Original message from "Yaocheng Liu" : -------------- > Thanks for the update. > > It would be great if there were no particles as reported by the last three > users. Here I would like to clarify the method we usually use to detect the > particles. > > With an optical microscope, we first have to make a good focus on the wafer > surface, then switch to dark field and MAXIMIZE the lamp intensity of the > microscope. If there are particles, we'll see "stars in the sky". The method > is very easy but you would not be able to see the particles (even if they > exist) if you don't do a good focus or don't maximize the lamp intensity. > > We actually found the particle problem with tylannitride about two years > ago. A lot of efforts have been put there to solve this problem. I'm not > sure if a permanent solution has been found. > > Yaocheng > > -----Original Message----- > From: Ami Chand [mailto:ami at appnano.com] > Sent: Wednesday, September 22, 2004 7:18 AM > To: 'Ke Wang'; tylannitride at snf.stanford.edu > Subject: RE: tylannitride > > > I ran NEWLSN 1000A. There were no particles. > > ami > > -----Original Message----- > From: Ke Wang [mailto:curlwang at stanford.edu] > Sent: Tuesday, September 21, 2004 6:05 PM > To: tylannitride at snf.stanford.edu > Subject: tylannitride > > > Hello dear tylannitride users, > > I saw reports from fengj on the maintenance page that large number of > particles were found in all of his recent depositions. I'm wondering if > other people are experiencing the same problem these days? I have a run > on Thursday which is kind of important to me, and I really don't want to > mess up. So if you have taken a look of your film under microscope, or > willing to bother to do so, please, please let me (us) know how it looks > like. > > Maurice, any comment on this? > > Thanks a lot!! > > Ke > > > _____________________________________________ > Ke Wang > PHD Candidate > Department of Applied Physics, Stanford University > > CISX B113-14 > Stanford, CA 94305-4070 > > Phone: (650)723-8040 > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From ami at appnano.com Wed Sep 22 11:28:55 2004 From: ami at appnano.com (Ami Chand) Date: Wed, 22 Sep 2004 11:28:55 -0700 Subject: Low stress nitride characteristrics In-Reply-To: Message-ID: <000001c4a0d2$04f1fa80$c004fea9@achand> Greetings, Does anyone know what happens to the low stress nitride if annealed at 1100 C ? Does it remain low stress or not? Any reference or input will be greatly appreciated. Thanks, ami From maurice at snf.stanford.edu Mon Sep 27 11:57:36 2004 From: maurice at snf.stanford.edu (Maurice Stevens) Date: Mon, 27 Sep 2004 11:57:36 -0700 Subject: Thick depositions Message-ID: <415862A0.1090100@snf.stanford.edu> If you plan on doing deposition over 1um, please let someone on the diffusion staff know. We need to make sure that it falls right before a burnbox clean and that other users are not also doing long runs. Over 4 microns was deposited yesterday. The burnbox had a positive pressure when it was inspected this morning. This is considered a safety issue. Failure to notify staff before a long deposition may indicate that a labusers needs retraining. -m From maurice at snf.stanford.edu Thu Sep 30 14:43:30 2004 From: maurice at snf.stanford.edu (Maurice Stevens) Date: Thu, 30 Sep 2004 14:43:30 -0700 Subject: Nitride results Message-ID: <415C7E02.9@snf.stanford.edu> pulled and cleaned. Uniformity and growthrate good. Bad Particles