From robinhmb at yahoo.com  Wed Apr 26 09:56:40 2006
From: robinhmb at yahoo.com (Robin King)
Date: Wed, 26 Apr 2006 09:56:40 -0700 (PDT)
Subject: nitride res removed for 11am today
Message-ID: <20060426165640.65743.qmail@web54710.mail.yahoo.com>

It's free until 3:30pm.

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From vossough at snf.stanford.edu  Thu Apr 27 21:20:06 2006
From: vossough at snf.stanford.edu (Kris Vossough)
Date: Thu, 27 Apr 2006 21:20:06 -0700 (PDT)
Subject: Nitride deposition 
Message-ID: <Pine.LNX.4.04.10604272046390.3482-100000@snf.stanford.edu>



Dear friends and nitride enthusiasts,

We are approaching a critical nitride deposition step in our process,
which requires using nitride mask for KOH etching of Si to a depth of 
about 200um. Previous concerns about the quality of the nitride film
has prompted us to ask the following questions from the community;

1. Have you had the tylannitride deposited (mask) film fail during KOH
etch, in the past 7-8 months ? if yes, please provide the recipe name and
a little detail (and approximate date).


2. Have you successfully used tylannitride film, as etch mask in KOH,
within the last 7-8 months ? please provide the recipe name and
approximate date.  


Looking forward to your comments.

Thanks,
--Kris