From eperalta at stanford.edu Mon Mar 14 19:11:29 2011 From: eperalta at stanford.edu (Edgar Peralta) Date: Mon, 14 Mar 2011 19:11:29 -0700 Subject: Low stress nitride on fused silica/quartz In-Reply-To: References: Message-ID: Hello all, Does anyone have experience depositing thick (~1um) nitride films on quartz or fused silica? I've tried it with both the NITRIDE2 and NEWLSN recipes and it both cases the resulting film contained cracks throughout. The higher temperature recipe (NEWLSN) actually seemed to be worse so I was thinking of trying the SINVAR recipe at maybe 650 C? I just wanted to double check if anyone has done this before and what their results were. Thank you for your time, Edgar p.s From a simple strain calculation it seems lower temp would be better: stress = E/(1-v) (alpha_film-alpha_sub)(T_dep- T_room) gives 275 MPa at 650 C compared with 366 MPa at 850 C (using E=270 GPa, v=.27, alpha=1.6e-6 1/C for nitride and alpha=.4e-6 1/C for silica) -------------- next part -------------- An HTML attachment was scrubbed... URL: