From gary.yama at rtc.bosch.com  Tue Jun 15 09:05:18 2004
From: gary.yama at rtc.bosch.com (Gary Yama)
Date: Tue, 15 Jun 2004 09:05:18 -0700
Subject: wafers not ready, free today 6/15, sorry for the late notice
Message-ID: <NIBBLBBPEIBAMDNJOKFLCEKDCAAA.gary.yama@rtc.bosch.com>

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From mmager at stanford.edu  Tue Jun 15 16:42:27 2004
From: mmager at stanford.edu (Morgan Douglas Mager)
Date: Tue, 15 Jun 2004 16:42:27 -0700
Subject: Thin Si deposition 
Message-ID: <1087342946.40cf896303bf1@webmail.stanford.edu>

Hi,
    I was wondering if anyone has ever tried to deposit very thin layers 
of poly or amorphous silicon. I'm interested in making films of both 
types, ideally as thin as 20nm. If anyone has experience with this, please 
let me know what programs/parameters seem to work best. How were the 
results? 
    Also, in general, how good is the residual stress control in poly or 
amorphous films? Thanks for any help you can offer.

-Morgan