From tberg at snf.stanford.edu Tue Sep 13 13:38:33 2005 From: tberg at snf.stanford.edu (tberg at snf.stanford.edu) Date: Tue, 13 Sep 2005 13:38:33 -0700 Subject: Problem tylansige SNF 2005-09-13 13:38:28: SiH4 flow is too High Message-ID: From pethe at snf.stanford.edu Tue Sep 13 14:36:34 2005 From: pethe at snf.stanford.edu (pethe at snf.stanford.edu) Date: Tue, 13 Sep 2005 14:36:34 -0700 Subject: Comment tylansige SNF 2005-09-13 14:36:33: Pls check the GeH4 cylinder before long dep Message-ID: The GeH4 bottle is low on gas. Please check with maintenace staff if you plan to do long Ge deps. From tberg at snf.stanford.edu Fri Sep 16 06:15:02 2005 From: tberg at snf.stanford.edu (tberg at snf.stanford.edu) Date: Fri, 16 Sep 2005 06:15:02 -0700 Subject: Comment tylansige SNF 2005-09-16 06:15:01: SiH4 MFC replaced needs test Message-ID: From maurice at snf.stanford.edu Tue Sep 20 16:15:41 2005 From: maurice at snf.stanford.edu (maurice at snf.stanford.edu) Date: Tue, 20 Sep 2005 16:15:41 -0700 Subject: Shutdown tylansige SNF 2005-09-20 16:15:38: pump off Message-ID: From maurice at snf.stanford.edu Tue Sep 20 16:31:48 2005 From: maurice at snf.stanford.edu (maurice at snf.stanford.edu) Date: Tue, 20 Sep 2005 16:31:48 -0700 Subject: Shutdown tylansige SNF 2005-09-20 16:15:38: pump off Message-ID: pump turned on after power glitch From pethe at snf.stanford.edu Wed Sep 28 16:47:31 2005 From: pethe at snf.stanford.edu (pethe at snf.stanford.edu) Date: Wed, 28 Sep 2005 16:47:31 -0700 Subject: Problem tylansige SNF 2005-09-28 16:47:30: Could not achieve Process Pressure Message-ID: We had a problem achieving Process Pressure on teh tube in standard processes ROHITS and COAT8. Both of them gave a PPC fault during the stabilization which continued through deposition. From aokyay at snf.stanford.edu Thu Sep 29 18:17:52 2005 From: aokyay at snf.stanford.edu (aokyay at snf.stanford.edu) Date: Thu, 29 Sep 2005 18:17:52 -0700 Subject: Comment tylansige SNF 2005-09-29 18:17:52: ran coat8 Message-ID: press error at 50 (stabilization) deposition step with no problem will run a test! ali