Problem tylansige SNF 2010-07-19 20:06:15: No Dep

[maurice at snf.stanford.edu]

chienyuc reports:
Running CHION with longer Si seed layer (20 minutes) and the Ge film dep rate is close to previous results.  No pressure nor flow problem observed.
Measured with woolam.  800A SiO2 substrate was used.
Si 500C 200mtoor 00:20:00 15~60A
Ge 300C 400mtorr 00:20:00 160~200A