Problem tylansige SNF 2010-07-19 20:06:15: No Dep

maurice at snf.stanford.edu maurice at snf.stanford.edu
Wed Jul 21 11:16:43 PDT 2010


chienyuc reports:
Running CHION with longer Si seed layer (20 minutes) and the Ge film dep rate is close to previous results.  No pressure nor flow problem observed.
Measured with woolam.  800A SiO2 substrate was used.
Si 500C 200mtoor 00:20:00 15~60A
Ge 300C 400mtorr 00:20:00 160~200A




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