From seymour at snf.stanford.edu  Tue Feb 13 08:28:14 2001
From: seymour at snf.stanford.edu (Ray Seymour)
Date: Tue, 13 Feb 2001 08:28:14 -0800
Subject: Silane flow
Message-ID: <3A89609E.8F9ADAC0@snf.stanford.edu>

Checked silane pressure and it was ok. Rezeroed MFC's and checked
furnace operation and it was ok. Unable to flow silane for any length of
time due to wafers left in the furnace.



From seymour at snf.stanford.edu  Wed Feb 14 15:30:32 2001
From: seymour at snf.stanford.edu (Ray Seymour)
Date: Wed, 14 Feb 2001 15:30:32 -0800
Subject: silane MFC
Message-ID: <3A8B1517.2E4F6C82@snf.stanford.edu>

I removed the Silane MFC and have sent it out for recalibration  on a 24
turn around basis.



From seymour at snf.stanford.edu  Tue Feb 20 15:36:05 2001
From: seymour at snf.stanford.edu (Ray Seymour)
Date: Tue, 20 Feb 2001 15:36:05 -0800
Subject: Silane flow
Message-ID: <3A92FF65.C61333F2@snf.stanford.edu>

The silane flow is no longer causes an error when flowed. the MFC was
recalibrated and now flows at 100.4 with a set point of 100.
System is being tested by Amol at this time.



From amol at stanford.edu  Tue Feb 20 15:59:24 2001
From: amol at stanford.edu (Amol Ramesh Joshi)
Date: Tue, 20 Feb 2001 15:59:24 -0800 (PST)
Subject: silane flow OK
Message-ID: <Pine.GSO.4.31.0102201558030.6372-100000@elaine3.Stanford.EDU>



	Hi,

	I did a test run and tried flowing 200 sccm SiH4 for 30 minutes.
There was no problem.

	- Amol