From jac17 at stanford.edu  Fri Oct 13 14:13:05 2000
From: jac17 at stanford.edu (john chiaverini)
Date: Fri, 13 Oct 2000 14:13:05 -0700 (PDT)
Subject: post-cut clean?
Message-ID: <Pine.GSO.4.21.0010131411110.1248-100000@myth7.Stanford.EDU>

wafersaw users,

is there a standard post-wafersaw clean?  my devices have a dingy "muddy
water" type of residue from the wafersaw, and spraying with solvents did
not seem to remove it.

thanks...

                              cannon (n.):
john chiaverini                 an instrument employed in the
                                rectification of national boundaries
jac17 at leland.stanford.edu                           --ambrose bierce 



From sjain at stanford.edu  Fri Oct 13 14:43:46 2000
From: sjain at stanford.edu (Sameer Hemchand Jain)
Date: Fri, 13 Oct 2000 14:43:46 -0700 (PDT)
Subject: post-cut clean?
In-Reply-To: <Pine.GSO.4.21.0010131411110.1248-100000@myth7.Stanford.EDU>
Message-ID: <Pine.GSO.4.21.0010131442050.26182-100000@elaine26.Stanford.EDU>

hi John,
   I generally coat my wafer with resist before I cut it .. and then strip
the resist in my own beakers... but then I do all this bcoz I have to get
the samples back into some of the machines in teh clean room.... I am not
sure what you would like to do with teh samples after you ahve cut
them. Let me know if you wnat o know more.

Sameer



On Fri, 13 Oct 2000, john chiaverini wrote:

> wafersaw users,
> 
> is there a standard post-wafersaw clean?  my devices have a dingy "muddy
> water" type of residue from the wafersaw, and spraying with solvents did
> not seem to remove it.
> 
> thanks...
> 
>                               cannon (n.):
> john chiaverini                 an instrument employed in the
>                                 rectification of national boundaries
> jac17 at leland.stanford.edu                           --ambrose bierce 
> 
>