From uthumser at stanford.edu  Mon Aug  1 11:08:11 2011
From: uthumser at stanford.edu (Uli Thumser)
Date: Mon, 01 Aug 2011 11:08:11 -0700
Subject: Aug 2, permanent change in standard pre-furnace clean
Message-ID: <4E36EB8B.6090305@stanford.edu>

Dear wbdiff users:

We would like you to be aware of upcoming changes in the standard 
pre-furnace clean procedures.
We've made a reservation tomorrow, August 2nd from 10 AM to 12 PM.
Instead of the 4:1 sulfuric-peroxide/HCl-SC2/HF dip sequence that has 
been standard at SNF for many years, we are going to use a standard RCA: 
SC1/SC2/HF dip.
SC1 consists of 5:1:1 H2O/H2O2/NH4OH (Ammonium Hydroxide).
The SC1 bath must be changed every four hours and the addition of H2O2 
is allowed, much the same as the SC2 bath, 5:1:1 H2O:H2O2:HCl.  The bath 
temperature is 50C and the time remains 10 minutes.
Note: today we replaced already two rows of sulfuric acid with Ammonium 
Hydroxide in the right chemical passthrough. Ammonium Hydroxide is no 
longer in the left passthrough.

SNF staff


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From jprovine at stanford.edu  Mon Aug  1 11:15:35 2011
From: jprovine at stanford.edu (J Provine)
Date: Mon, 1 Aug 2011 11:15:35 -0700
Subject: Aug 2, permanent change in standard pre-furnace clean
In-Reply-To: <4E36EB8B.6090305@stanford.edu>
References: <4E36EB8B.6090305@stanford.edu>
Message-ID: <CAOKRUaktzvwqzqBRwcXM9w9sDbKvZj-=VS4Wt8KqQVoJR-wLrw@mail.gmail.com>

where should we go to find the data from your tests comparing this new clean
with the cleans that have been in use?
this is a exciting step forward to be more inline with the industrial
standard.
j

On Mon, Aug 1, 2011 at 11:08 AM, Uli Thumser <uthumser at stanford.edu> wrote:

>  Dear wbdiff users:
>
> We would like you to be aware of upcoming changes in the standard
> pre-furnace clean procedures.
> We've made a reservation tomorrow, August 2nd from 10 AM to 12 PM.
> Instead of the 4:1 sulfuric-peroxide/HCl-SC2/HF dip sequence that has been
> standard at SNF for many years, we are going to use a standard RCA: SC1/SC2/HF
> dip.
> SC1 consists of 5:1:1 H2O/H2O2/NH4OH (Ammonium Hydroxide).
> The SC1 bath must be changed every four hours and the addition of H2O2 is
> allowed, much the same as the SC2 bath, 5:1:1 H2O:H2O2:HCl.  The bath
> temperature is 50C and the time remains 10 minutes.
> Note: today we replaced already two rows of sulfuric acid with Ammonium
> Hydroxide in the right chemical passthrough. Ammonium Hydroxide is no
> longer in the left passthrough.
>
> SNF staff
>
>
>
>
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From sgchong at stanford.edu  Tue Aug  9 12:21:05 2011
From: sgchong at stanford.edu (Soogine Chong)
Date: Tue, 9 Aug 2011 12:21:05 -0700 (PDT)
Subject: Two wafers in wbdiff cassette
Message-ID: <831193844.1045759.1312917665450.JavaMail.root@zm07.stanford.edu>

Hi

I left two wafers in a wbdiff cassette on the table in front of the wbsolvent bench. I'll remove them after lunch. Please leave them where they are. 

Thank you!

Soogine

-- 
Soogine Chong
Stanford University
PhD candidate in Electrical Engineering
e-mail: sgchong at stanford.edu
mobile: +1-650-804-8556