From masafumi at stanford.edu  Sat Mar  5 22:16:31 2005
From: masafumi at stanford.edu (masa)
Date: Sat, 05 Mar 2005 22:16:31 -0800
Subject: done early
In-Reply-To: <1107209192.41feabe808898@webmail.stanford.edu>
References: <1107209192.41feabe808898@webmail.stanford.edu>
Message-ID: <20050305221548.A4CE.MASAFUMI@stanford.edu>

Now it's available.

Thanks.
Masa


From okilic at stanford.edu  Thu Mar 17 15:18:29 2005
From: okilic at stanford.edu (Onur Kilic)
Date: Thu, 17 Mar 2005 15:18:29 -0800
Subject: TMAH question
Message-ID: <1111101509.423a10453381e@webmail.stanford.edu>

Hi,

I am trying to etch Silicon <100> in TMAH with a surface quality as good as
possible.

I found in the literature that by adding a very small amount of either
Ammonium Persulfate, or a surfactant called NCW601A (Wako) improves the
surface quality drastically (I believe both are not available in SNF).

Does anyone has experience with these?

Or even better, do you know of a simple receipe that I can use. (Something
like a certain TMAH concentration and stirring etc., or adding IPA e.g.)???

Best,

Onur

-- 
Onur Kilic
PhD Candidate
Applied Physics
Stanford University
http://onurkilic.com