From filip at stanford.edu  Wed Aug 27 16:47:31 2008
From: filip at stanford.edu (Filip Crnogorac)
Date: Wed, 27 Aug 2008 16:47:31 -0700 (PDT)
Subject: TMAH question
Message-ID: <1228547773.131871219880851750.JavaMail.root@zm09.stanford.edu>

Hi CTB users,

Does anyone use dilute TMAH for Si etching? I used to use KOH, but am looking for a fast Si etch that will stop on oxide. In particular I would like to know what concentration and what temperature do you use. 

I found references that show 2um/min with 2% TMAH at 90C. Does anyone have experience with this?

Thanks in advance.
Cheers,

Filip

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Ph.D. Candidate, Stanford University
Department of Electrical Engineering
Center for Integrated Systems
B-103, 420 Via Palou
Stanford, CA 94305