From ankurjn at stanford.edu  Tue May  2 17:44:13 2006
From: ankurjn at stanford.edu (Ankur Jain)
Date: Tue,  2 May 2006 17:44:13 -0700
Subject: Etch rate of Al in AL-11 Aluminum Etchant
Message-ID: <1146617053.4457fcddd070b@webmail.stanford.edu>

Hello all,
 I would like to find out the typical etch rate of thin film Al (around 100
nm) in the Aluminum etchant available at SNF. If you have any numbers from
your experiments, I would appreciate it if you could let me know.

thanks,

Ankur.



From nlatta at stanford.edu  Wed May  3 17:07:47 2006
From: nlatta at stanford.edu (Nancy Latta)
Date: Wed, 03 May 2006 17:07:47 -0700
Subject: PRX127
Message-ID: <445945D3.8060708@stanford.edu>

Folks,

As many of you have found out, our shipment of PRX127 did not make it 
here.  There was a bad batch of a chemical that requires very long lead 
times.  The vendor is scrambling about trying to find us a case to tide 
us over, but won't know until tomorrow.

If that case does not work out, we will clean and adjust the hot pot to 
accommodate PRS1000.  This what we used to have before the PRX127 and it 
will work as a resist stripper.  It does not, however, strip polymers 
left from plasma etching.

We will keep you posted on any developments around this issue.

-Nancy



From nlatta at stanford.edu  Fri May  5 15:57:53 2006
From: nlatta at stanford.edu (Nancy Latta)
Date: Fri, 05 May 2006 15:57:53 -0700
Subject: PRS1000 is the new PRX127
Message-ID: <445BD871.9030603@stanford.edu>

Folks,

The shipment of PRX127 did not arrive today, so the photoresist strip 
bath was cleaned, dried and filled with PRS1000.  It is used in the same 
way as the PRX127; 40C, 20 mins, so there will be no changes to the user.

It will not strip any polymers from plasma etching.  If you are 
concerned about polymers please use the gasonic or drtyek2 to remove 
polymer.

When we switch back to PRX1000 a message will be sent out.

-Nancy



From jhaydon at stanford.edu  Tue May  9 14:15:11 2006
From: jhaydon at stanford.edu (Jim Haydon)
Date: Tue, 09 May 2006 14:15:11 -0700
Subject: Dump Rinser upgrade
Message-ID: <4461065F.7000308@stanford.edu>

The WBmetal bench will be out of service on 5/16 and possibly through 
5/17 for the installation of new dump rinsers and deck plating.  Please 
see Uli for alternative an bench. Sorry for the inconvenience.


Jim Haydon



From tura at ucla.edu  Wed May 17 23:15:59 2006
From: tura at ucla.edu (Ahmet Tura)
Date: Wed, 17 May 2006 23:15:59 -0700
Subject: wet etching Al over Ti
Message-ID: <20060517231559.8ysfsnymzkkswo0w@mail.ucla.edu>


I need to wet etch Al and Ti together (~1500A of Al over ~500A Ti) with 
 >5:1 selectivity to SiO2, and I was wondering what is the best way to 
do this. Is it normally done in two steps, or is there a chemical that 
can etch both? Does the Ti etchant (5:1:1 H20:H2O2:NH4OH) etch Al? Is 
there anything wrong with using 50:1 HF to etch both?

Nancy is out until mid-next week so I had to ask this to the metal 
bench users. Thanks for your help,

-- 
Ahmet Tura




From nlatta at stanford.edu  Thu May 25 17:04:20 2006
From: nlatta at stanford.edu (Nancy Latta)
Date: Thu, 25 May 2006 17:04:20 -0700
Subject: PRX127 is back!
Message-ID: <44764604.3070506@stanford.edu>

Folks,

We have a limited order of PRX127 with more on the way.  The PRX127 bath 
is now back to being filled with PRX127.

Just a small caution, please be conservative with your bath changes.  Do 
not change the bath unless you really need to.  We'd like to avoid any 
more shortages of the chemical.

Thanks,

-Nancy