From nvgirish at snf.stanford.edu Wed Apr 5 05:47:50 2006 From: nvgirish at snf.stanford.edu (nvgirish at snf.stanford.edu) Date: Wed, 5 Apr 2006 05:47:50 -0700 Subject: Problem wbnonmetal SNF 2006-04-05 05:47:50: Piece in left sulfuric peroxide hotpot Message-ID: HI all I was changing the chemicals in the left sulfuric peroxide hot pot when I espied a piece of silicon at the bottom of the pot. Also, the 6:1 BOE bath was open and white residue all along the inside of the bath. The cover was lying face up on the bench. Just wanted to point these out. Cheers Girish From yeh at snf.stanford.edu Thu Apr 13 01:39:23 2006 From: yeh at snf.stanford.edu (yeh at snf.stanford.edu) Date: Thu, 13 Apr 2006 01:39:23 -0700 Subject: Problem wbnonmetal SNF 2006-04-13 01:39:05: right rinse tank not working Message-ID: no DI water in tank From yeh at snf.stanford.edu Thu Apr 27 05:13:37 2006 From: yeh at snf.stanford.edu (yeh at snf.stanford.edu) Date: Thu, 27 Apr 2006 05:13:37 -0700 Subject: Comment wbnonmetal SNF 2006-04-27 05:13:37: spin rinse/dryer might be contaminated Message-ID: my wafers were in the spin rinse/dryer for over 20min before I mannually stopped it. resistivity remained below 8.3mega-ohm-cm despite over 20min of continuous rinse. wafers have only poly/nit/poly/oxide stack. went through p5000 poly etch, 50:1 HF dip, piranha, and another HF dip before putting into the spin/dryer.