Comment wbnonmetal SNF 2006-04-27 05:13:37: spin rinse/dryer might be contaminated

yeh at snf.stanford.edu yeh at snf.stanford.edu
Thu Apr 27 05:13:37 PDT 2006


my wafers were in the spin rinse/dryer for over 20min before I mannually stopped it.  resistivity remained below 8.3mega-ohm-cm despite over 20min of continuous rinse.  wafers have only poly/nit/poly/oxide stack.  went through p5000 poly etch, 50:1 HF dip, piranha, and another HF dip before putting into the spin/dryer.




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