From beckwith at snf.stanford.edu Mon Jan 7 11:51:29 2002 From: beckwith at snf.stanford.edu (Sharleen Beckwith) Date: Mon, 7 Jan 2002 11:51:29 -0800 (PST) Subject: broken wafers in the hot pots Message-ID: Folks: When you break a wafer in ANY of the hot pots you should immediately report this to staff. I just found pulverized wafers in the bottom of the PRX127. This will lead to Silicon dust depositing on all other wafers going through this hot pot. Jim Hadyon and I just cleaned out the hot pot. It is YOUR responsibility to take care of your own mistakes, NOT mine. My boss does not pay me to clean up after you. Be responsible for your own actions, clean up after yourselves. From PZwahlen at zyomyx.com Fri Jan 11 19:07:30 2002 From: PZwahlen at zyomyx.com (Zwahlen, Pascal) Date: Fri, 11 Jan 2002 19:07:30 -0800 Subject: HF spills Message-ID: Hi, As I wanted to use the BOE (6:1) bath I found the cover of the tank full of HF cristals. Whoever spilled HF there, please clean up after yourself. HF is a very harmful acid and you are working in a shared facility. So, please take your responsibility and clean after yourself. Pascal Zwahlen From hector at nanodevices.com Wed Jan 30 12:57:57 2002 From: hector at nanodevices.com (Hector Cavazos) Date: Wed, 30 Jan 2002 12:57:57 -0800 Subject: Oh what a wonderful mess it was! Message-ID: 1. Sulfuric/peroxide on the bench deck 2. HF crystals on the bench deck 3. A lot of crud floating in the left sulfuric/peroxide hot pot Fortunately the crud in the hot pot was big sheets of photoresist... Even though the pot was up to temp, 127C, it took some peroxide to do away with it. This lab is becomming more dangerous... we ALL need to take more responsibility before danger strikes and shuts this place down. -Concerned fab boy ps - it took more time for me to come out of the fab and write this email (even though I was told to by an SNF staff member) than it did to just clean up...hmmm?!