Wet Bench Use Poll

Chi On Chui chion at stanford.edu
Tue Apr 29 23:05:39 PDT 2003

I'm currently using the silicide wetbench for the diff cleaning required
before going the LTO (metal-side) and RTA (silicide tray). I'm
working standard CMOS processing.

/Chi On

> Due to increasing interest in fusion (sometimes called direct) wafer
> bonding and the cleaning required for good bonds, we are taking a look
> at the use of the silicide wet bench.  Can you please take a moment and
> reply to this email with a short description of what you use the bench
> for, esp if you are actually using silicides in your process.
> Thanks you for responding,
> 				Nancy

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