Wet Bench Use Poll

Gary Yama gyama at snf.stanford.edu
Wed Apr 30 09:14:31 PDT 2003


Nancy,

We need to do a KOH decontamination at least once a month.  There needs to be a permanent place to do this as it would  be a hassle to have to set up
a station every time.

Gary

Nancy Latta wrote:

> Dear Wbsilicide User,
>
> Due to increasing interest in fusion (sometimes called direct) wafer
> bonding and the cleaning required for good bonds, we are taking a look
> at the use of the silicide wet bench.  Can you please take a moment and
> reply to this email with a short description of what you use the bench
> for, esp if you are actually using silicides in your process.
>
> Thanks you for responding,
>
>                                 Nancy
>
> --
> Nancy Latta
> Stanford Nanofabrication Facility
> CIS Room 145
> 420 Via Palou Mall
> Stanford, CA 94305-4070
> (650) 725-6727
> latta at snf.stanford.edu




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