From ethrush at stanford.edu Fri Apr 12 11:44:00 2002 From: ethrush at stanford.edu (Evan Thrush) Date: Fri, 12 Apr 2002 11:44:00 -0700 Subject: Temperature controlled ultrasonic bathtub Message-ID: <5.1.0.14.2.20020412112510.02d0cf58@snow.stanford.edu> Hello fellow wbgaassol users, Are you tired of waiting hours, even days to strip photoresist from your wafer after dry etching with the plasma quest? Are you tired of waiting hours to perform liftoff metalization? I am pretty tired of it and I think there are some pretty simple modifications to the bench that will make our lives much easier. Many months ago, SNF purchased a nice temperature controlled untrasonic bathtub for this bench. It has not been available to us because SNF staff wants to make modifications to the bench for the safe instillation of the bathtub. Not much has been done towards the instillation for several months. I think I have got the ball rolling again on the instillation and supposedly the instillation will be complete in several weeks. It is important for users of the bench to let SNF staff know how much this modification will be valued, so that they will complete the task in a timely manner and also feel like their hard work is valued. Anyway, I plan on using this tube to strip photoresist with 1165 remover. The temperature controlled bath will be a huge benefit when compared to the difficult to use analog hot plates that are currently at the bench. I frankly feel that the analog hot plate are dangerous because the temperature is difficult to control. It is important to not allow the temperature of the removing solvent not to exceed the flashpoint, which for 1165 is 85 C. I plan on heating the solvent up to about 60 C and this combined with ultrasonic vibration will expedite the removal of the resist. Thanks you for your time and I look forward to hearing feedback on this new processing improvement, Evan ------------------------------------------------------------------------------------------------------ Evan Thrush Stanford University; E.E. PhD Candidate CIS-X Rm. B113-21, Stanford, CA 94305-4075 Phone: (650)725-2774 E-mail: ethrush at snow.stanford.edu Fax: (650)723-4659 Homepage: http://snow.stanford.edu/~ethrush From scaccag at Stanford.EDU Fri Apr 12 18:41:00 2002 From: scaccag at Stanford.EDU (Luigi Scaccabarozzi) Date: Fri, 12 Apr 2002 18:41:00 -0700 (PDT) Subject: Temperature controlled ultrasonic bathtub In-Reply-To: <5.1.0.14.2.20020412112510.02d0cf58@snow.stanford.edu> Message-ID: Hello all, I fully agree with Evan, it would be great to have such a device available. Luigi On Fri, 12 Apr 2002, Evan Thrush wrote: > Hello fellow wbgaassol users, > > Are you tired of waiting hours, even days to strip photoresist from your > wafer after dry etching with the plasma quest? Are you tired of waiting > hours to perform liftoff metalization? I am pretty tired of it and I think > there are some pretty simple modifications to the bench that will make our > lives much easier. Many months ago, SNF purchased a nice temperature > controlled untrasonic bathtub for this bench. It has not been available to > us because SNF staff wants to make modifications to the bench for the safe > instillation of the bathtub. Not much has been done towards the > instillation for several months. I think I have got the ball rolling again > on the instillation and supposedly the instillation will be complete in > several weeks. It is important for users of the bench to let SNF staff > know how much this modification will be valued, so that they will complete > the task in a timely manner and also feel like their hard work is valued. > > Anyway, I plan on using this tube to strip photoresist with 1165 > remover. The temperature controlled bath will be a huge benefit when > compared to the difficult to use analog hot plates that are currently at > the bench. I frankly feel that the analog hot plate are dangerous because > the temperature is difficult to control. It is important to not allow the > temperature of the removing solvent not to exceed the flashpoint, which for > 1165 is 85 C. I plan on heating the solvent up to about 60 C and this > combined with ultrasonic vibration will expedite the removal of the resist. > > Thanks you for your time and I look forward to hearing feedback on this new > processing improvement, > > Evan > > ------------------------------------------------------------------------------------------------------ > > Evan Thrush > Stanford University; E.E. PhD Candidate > CIS-X Rm. B113-21, Stanford, CA 94305-4075 > Phone: (650)725-2774 E-mail: ethrush at snow.stanford.edu > Fax: (650)723-4659 Homepage: http://snow.stanford.edu/~ethrush >